Article Versions Notes

Jaroszynska A, Dabrowski M, Sadovy P, Bockowski M, Czernecki R, Sochacki T. On Morphology of Aluminum–Gallium Nitride Layers Grown by Halide Vapor Phase Epitaxy: The Role of Total Reactants’ Pressure and Ammonia Flow Rate. Materials. 2024; 17(14):3446. https://doi.org/10.3390/ma17143446

Jaroszynska, Arianna, Michal Dabrowski, Petro Sadovy, Michal Bockowski, Robert Czernecki, and Tomasz Sochacki. 2024. "On Morphology of Aluminum–Gallium Nitride Layers Grown by Halide Vapor Phase Epitaxy: The Role of Total Reactants’ Pressure and Ammonia Flow Rate" Materials 17, no. 14: 3446. https://doi.org/10.3390/ma17143446

Jaroszynska, A., Dabrowski, M., Sadovy, P., Bockowski, M., Czernecki, R., & Sochacki, T. (2024). On Morphology of Aluminum–Gallium Nitride Layers Grown by Halide Vapor Phase Epitaxy: The Role of Total Reactants’ Pressure and Ammonia Flow Rate. Materials, 17(14), 3446. https://doi.org/10.3390/ma17143446