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Journal: Materials, 2023
Volume: 16
Number: 2285

Article: Effect of Gate Bias Stress on the Electrical Characteristics of Ferroelectric Oxide Thin-Film Transistors with Poly(Vinylidenefluoride-Trifluoroethylene)
Authors: by Bon-Seong Gu, Eun-Seo Park, Jin-Hyuk Kwon and Min-Hoi Kim
Link: https://www.mdpi.com/1996-1944/16/6/2285

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