Kim, S.Y.; Jung, Y.C.; Seong, S.; Lee, T.; Park, I.-S.; Ahn, J.
Microstructures of HfOx Films Prepared via Atomic Layer Deposition Using La(NO3)3·6H2O Oxidants. Materials 2021, 14, 7478.
https://doi.org/10.3390/ma14237478
AMA Style
Kim SY, Jung YC, Seong S, Lee T, Park I-S, Ahn J.
Microstructures of HfOx Films Prepared via Atomic Layer Deposition Using La(NO3)3·6H2O Oxidants. Materials. 2021; 14(23):7478.
https://doi.org/10.3390/ma14237478
Chicago/Turabian Style
Kim, Seon Yong, Yong Chan Jung, Sejong Seong, Taehoon Lee, In-Sung Park, and Jinho Ahn.
2021. "Microstructures of HfOx Films Prepared via Atomic Layer Deposition Using La(NO3)3·6H2O Oxidants" Materials 14, no. 23: 7478.
https://doi.org/10.3390/ma14237478
APA Style
Kim, S. Y., Jung, Y. C., Seong, S., Lee, T., Park, I.-S., & Ahn, J.
(2021). Microstructures of HfOx Films Prepared via Atomic Layer Deposition Using La(NO3)3·6H2O Oxidants. Materials, 14(23), 7478.
https://doi.org/10.3390/ma14237478