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Open AccessArticle

Al/Si Nanopillars as Very Sensitive SERS Substrates

Centre de Nanosciences et de Nanotechnologies, CNRS, University Paris Sud, Université Paris-Saclay, C2N-Orsay, CEDEX, 91405 Orsay, France
EPF-Ecole d’Ingénieurs, 3 Bis Rue Lakanal, 92330 Sceaux, France
Author to whom correspondence should be addressed.
Materials 2018, 11(9), 1534;
Received: 20 July 2018 / Revised: 16 August 2018 / Accepted: 23 August 2018 / Published: 26 August 2018
(This article belongs to the Special Issue Plasmonics and its Applications)
In this paper, we present a fast fabrication of Al/Si nanopillars for an ultrasensitive SERS detection of chemical molecules. The fabrication process is only composed of two steps: use of a native oxide layer as a physical etch mask followed by evaporation of an aluminum layer. A random arrangement of well-defined Al/Si nanopillars is obtained on a large-area wafer of Si. A good uniformity of SERS signal is achieved on the whole wafer. Finally, we investigated experimentally the sensitivity of these Al/Si nanopillars for SERS sensing, and analytical enhancement factors in the range of 1.5 × 10 7 − 2.5 × 10 7 were found for the detection of thiophenol molecules. Additionally, 3D FDTD simulations were used to better understand optical properties of Al/Si nanopillars as well as the Raman enhancement. View Full-Text
Keywords: SERS; sensors; aluminum; silicon SERS; sensors; aluminum; silicon
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Magno, G.; Bélier, B.; Barbillon, G. Al/Si Nanopillars as Very Sensitive SERS Substrates. Materials 2018, 11, 1534.

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