Shin, W.; Nishibori, M.; Itoh, T.; Izu, N.; Matsubara, I.
Enhancing the Responsiveness of Thermoelectric Gas Sensors with Boron-Doped and Thermally Annealed SiGe Thin Films via Low-Pressure Chemical Vapor Deposition. Sensors 2024, 24, 3058.
https://doi.org/10.3390/s24103058
AMA Style
Shin W, Nishibori M, Itoh T, Izu N, Matsubara I.
Enhancing the Responsiveness of Thermoelectric Gas Sensors with Boron-Doped and Thermally Annealed SiGe Thin Films via Low-Pressure Chemical Vapor Deposition. Sensors. 2024; 24(10):3058.
https://doi.org/10.3390/s24103058
Chicago/Turabian Style
Shin, Woosuck, Maiko Nishibori, Toshio Itoh, Noriya Izu, and Ichiro Matsubara.
2024. "Enhancing the Responsiveness of Thermoelectric Gas Sensors with Boron-Doped and Thermally Annealed SiGe Thin Films via Low-Pressure Chemical Vapor Deposition" Sensors 24, no. 10: 3058.
https://doi.org/10.3390/s24103058
APA Style
Shin, W., Nishibori, M., Itoh, T., Izu, N., & Matsubara, I.
(2024). Enhancing the Responsiveness of Thermoelectric Gas Sensors with Boron-Doped and Thermally Annealed SiGe Thin Films via Low-Pressure Chemical Vapor Deposition. Sensors, 24(10), 3058.
https://doi.org/10.3390/s24103058