Article Versions Notes

Amato U, Antoniadis A, De Feis I, Fazio D, Genua C, Gijbels I, Granata D, La Magna A, Pagano D, Tochino G, et al. Predictive Maintenance of Pins in the ECD Equipment for Cu Deposition in the Semiconductor Industry. Sensors. 2023; 23(14):6249. https://doi.org/10.3390/s23146249

Amato, Umberto, Anestis Antoniadis, Italia De Feis, Domenico Fazio, Caterina Genua, Irène Gijbels, Donatella Granata, Antonino La Magna, Daniele Pagano, Gabriele Tochino, and et al. 2023. "Predictive Maintenance of Pins in the ECD Equipment for Cu Deposition in the Semiconductor Industry" Sensors 23, no. 14: 6249. https://doi.org/10.3390/s23146249

Amato, U., Antoniadis, A., De Feis, I., Fazio, D., Genua, C., Gijbels, I., Granata, D., La Magna, A., Pagano, D., Tochino, G., & Vasquez, P. (2023). Predictive Maintenance of Pins in the ECD Equipment for Cu Deposition in the Semiconductor Industry. Sensors, 23(14), 6249. https://doi.org/10.3390/s23146249