Integral Algorithms to Evaluate TiO2 and N-TiO2 Thin Films’ Cytocompatibility
Abstract
:1. Introduction
2. Results
2.1. Sample Characteristics
2.2. Surface Characteristics
2.3. Raman Scattering
2.4. TiO2 and TiOxNy Coatings’ Cytocompatibility
3. Discussion
4. Materials and Methods
4.1. Sample Coatings
4.2. Scanning Electron Microscopy (SEM)
4.3. Raman Scattering
4.4. Cytocompatibility Evaluation
4.4.1. Materials
4.4.2. Direct Cytotoxicity Evaluation
4.4.3. Evaluation of Cell Adhesion
4.4.4. Cell Viability Assay
4.4.5. NO Production Assay
4.5. Development of an Algorithm for Assessing the Cytocompatibility of Coatings
4.5.1. Integrated Assessment of the Studied Indicators
- The direct cytotoxicity of thin films (by the MTT test) to assess the toxic effect of thin films which can prevent cell-to-surface contacts in living systems;
- The adhesion of cells on the samples’ surface to assess the probability of cells seeding after contact;
- Cell viability to assess the relative survival of cells on the samples’ surface, indicating the formation of a proliferating cell biofilm;
- NO production to assess the functional activity of endothelial cells.
4.5.2. Decision Tree Algorithm
- -
- Optimal cytocompatibility had a surface with no red leaf and at least two green leaves;
- -
- A surface was considered acceptable with three green or yellow leaves;
- -
- The cytocompatibility was classified as uncertain when two leaves were red;
- -
- The surface was determined to be unacceptable when three leaves were red.
4.6. Statistical Analysis
5. Conclusions
- By comparing two algorithms for assessing the thin films’ cytocompatibility, we have shown that DTA provides more detailed information on the changes in the properties of the studied coatings, which depend on the sputtering mode, the surface morphology, and the crystalline phase.
- N-TiO2 coatings sputtered in modes providing a predominance of the rutile crystalline phase make it possible to obtain the most cytocompatible thin films.
- The evaluation of thin films using both algorithms demonstrated the best cytocompatibility of Sample No. 4 sputtered at 0 V and N:O = 1:1. The surfaces of Samples No. 7 (−100 V; N:O = 3:1) and No. 8 (0 V; N:O = 3:1) had acceptable cytocompatibility.
6. Limitations
Supplementary Materials
Author Contributions
Funding
Institutional Review Board Statement
Informed Consent Statement
Data Availability Statement
Conflicts of Interest
References
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Sample No. | O2/N2 Ratio | Bias Voltage, V | Film | N (wt%) | O (wt%) | O/N AR |
---|---|---|---|---|---|---|
(While Sputtering) | In the Thin Film | |||||
1 | - | −100 | TiO2 | - | 22.07 ± 0.09 | - |
2 | - | 0 | TiO2 | - | 22.27 ± 0.12 | - |
3 | 1 | −100 | Ti-O-N | 5.42 ± 0.28 | 24.36 ± 0.61 | 3.94 ± 0.14 |
4 | 1 | 0 | Ti-O-N | 5.13 ± 0.06 | 23.97 ± 0.23 | 4.08 ± 0.01 |
5 | 0.5 | −100 | Ti-O-N | 4.87 ± 0.12 | 21.01 ± 0.20 | 3.79 ± 0.12 |
6 | 0.5 | 0 | Ti-O-N | 5.31 ± 0.08 | 22.95 ± 0.14 | 3.79 ± 0.04 |
7 | 0.33 | −100 | Ti-O-N | 4.77 ± 0.05 | 20.08 ± 0.29 | 3.68 ± 0.09 |
8 | 0.33 | 0 | Ti-O-N | 4.85 ± 0.05 | 21.55 ± 0.05 | 3.89 ± 0.05 |
C | - | - | - | - | - | - |
Sample No. | Direct Cytotoxicity, % | Adhesion and Spreading of Cells’ Relative Content from NiTi, % | Viability of Cells, % | NO Production, µM/mL |
---|---|---|---|---|
No. 1 | 63.9 ± 2.9 | 114.5 ± 23.3 | 87.4 ± 7.5 | 14.6 ± 3.1 |
No. 2 | 87.1 ± 3.4 | 261.9 ± 67.7 | 75.8 ± 9.2 | 13.5 ± 2.6 |
No. 3 | 66.9 ± 4.2 | 180.6 ± 60.9 | 83.0 ± 5.8 | 17.7 ± 0.5 |
No. 4 | 86.6 ± 5.3 | 279.5 ± 20.8 | 88.7 ± 3.3 | 22.1 ± 5.4 |
No. 5 | 68.8 ± 3.6 | 180.2 ± 19.0 | 94.4 ± 2.3 | 9.8 ± 3.2 |
No. 6 | 70.2 ± 4.5 | 126.4 ±34.2 | 87.5 ± 2.7 | 12.5 ± 2.4 |
No. 7 | 79.1 ± 3.1 | 312.1 ± 38.2 | 84.1 ± 4.9 | 56.2 ± 31.4 |
No. 8 | 79.0 ± 3.5 | 259.0 ± 39.1 | 83.1 ± 6.2 | 52.2 ± 13.7 |
Control (NiTi) | 71.7 ± 3.6 | 100 ± 0 | 64.6 ± 29.7 | 16.1 ± 2.4 |
Criterion | Parameter | ||
---|---|---|---|
Unacceptable Level (Score = 0) | Moderate Level (Score = 1) | Optimal Level (Score = 2) | |
Direct cytotoxicity, % (relative cell viability in the MTT test) | Bare NiTi control’s level or less (≤72%), high surface cytotoxicity | > Bare NiTi control ≤85% (73–85%), moderate cytotoxicity | >85%, low cytotoxicity |
Cell adhesion, % (390 cells/mm2 = 100% adhesion on the bare NiTi surface) | <150% of the bare NiTi control’s level, low adhesion | 150–250% of the bare NiTi control’s level, moderate adhesion | >250% of the bare NiTi control’s level, high adhesion |
Cell viability, % (relative content of living cells on the sample’s surface) | <85%, non-cytocompatible surface | - | ≥85%, cytocompatible surface |
NO production, μM/mL, (16 μM/mL- NO production on the bare NiTi surface) | Bare NiTi control’s level or less (<16 μM/mL), low functional activity | >Bare NiTi control, but <150% of the bare NiTi control’s level (16–24 μM/mL), moderate functional activity | >150% of the bare NiTi control’s level (>24 μM/mL). high functional activity |
Criterion | No. 1 | No. 2 | No. 3 | No. 4 | No. 5 | No. 6 | No. 7 | No. 8 | Control (NiTi) |
---|---|---|---|---|---|---|---|---|---|
Direct cytotoxicity | 0 | 1.8 ± 0.41 | 0.3 ± 0.52 | 1.5 ± 0.55 | 0.2 ± 0.41 | 0.3 ± 0.52 | 1 ± 0 | 1.2 ± 0.41 | 0.3 ± 0.52 |
Adhesion and spreading of cells | 0 | 1.6 ± 0.55 | 0.8 ± 0.50 | 2 ± 0 | 1 ± 0 | 0.3 ± 0.50 | 2 ± 0 | 1.3 ± 0.50 | 0 |
Viability of cells | 1.3 ± 0.82 | 0.5 ± 0.55 | 0.8 + 0.45 | 1.4 ± 0.55 | 2 ± 0 | 1.2 ± 0.45 | 0.8 ± 0.45 | 0.6 ± 0.89 | 0.7 ± 1.0 |
NO production | 0.3 ± 0.52 | 0 ± 0 | 1 ± 0 | 1.3 ± 0.52 | 0 ± 0 | 0 ± 0 | 2 ± 0 | 2 ± 0 | 0.5 ± 0.55 |
ICI (ICImax = 8) | 1.6 | 3.9 | 2.9 | 6.2 | 3.2 | 1.8 | 5.8 | 5.1 | 1.5 |
Sample No. | Partial Gas Pressure, Pa, N2/O2 | Negative Bias Voltage | Films | N2/O2 Ratio |
---|---|---|---|---|
control (NiTi) | - | - | - | - |
1 | 0/0.130 | U = −100 V | TiO2 | - |
2 | 0/0.130 | U = 0 | TiO2 | - |
3 | 0.065/0.065 | U = −100 V | Ti-O-N | 1/1 |
4 | 0.065/0.065 | U = 0 | Ti-O-N | 1/1 |
5 | 0.087/0.046 | U = −100 V | Ti-O-N | 2/1 |
6 | 0.087/0.046 | U = 0 | Ti-O-N | 2/1 |
7 | 0.102/0.033 | U = −100 V | Ti-O-N | 3/1 |
8 | 0.102/0.033 | U = 0 | Ti-O-N | 3/1 |
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Zhuravleva, I.Y.; Surovtseva, M.A.; Alshevskaya, A.A.; Surovtsev, N.V.; Okotrub, K.A.; Kim, I.I.; Nasimov, D.A.; Bondarenko, N.A.; Kuzmin, O.S.; Poveshchenko, O.V. Integral Algorithms to Evaluate TiO2 and N-TiO2 Thin Films’ Cytocompatibility. Int. J. Mol. Sci. 2022, 23, 15183. https://doi.org/10.3390/ijms232315183
Zhuravleva IY, Surovtseva MA, Alshevskaya AA, Surovtsev NV, Okotrub KA, Kim II, Nasimov DA, Bondarenko NA, Kuzmin OS, Poveshchenko OV. Integral Algorithms to Evaluate TiO2 and N-TiO2 Thin Films’ Cytocompatibility. International Journal of Molecular Sciences. 2022; 23(23):15183. https://doi.org/10.3390/ijms232315183
Chicago/Turabian StyleZhuravleva, Irina Yu., Maria A. Surovtseva, Alina A. Alshevskaya, Nikolay V. Surovtsev, Konstantin A. Okotrub, Irina I. Kim, Dmitriy A. Nasimov, Natalia A. Bondarenko, Oleg S. Kuzmin, and Olga V. Poveshchenko. 2022. "Integral Algorithms to Evaluate TiO2 and N-TiO2 Thin Films’ Cytocompatibility" International Journal of Molecular Sciences 23, no. 23: 15183. https://doi.org/10.3390/ijms232315183