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Borane–trimethylamine complex (Me₃N·BH₃; BTM) is the most stable of the amine–borane complexes that are commercially available, and it is cost-effective. It is a valuable reagent in organic chemistry with applications in the reduction of carbonyl groups and carbon–nitrogen double bond reduction, with considerable examples in the reduction of oximes, hydrazones and azines. The transfer hydrogenation of aromatic N-heterocycles and the selective N-monomethylation of primary anilines are further examples of recent applications, whereas the reduction of nitrobenzenes to anilines and the reductive deprotection of N-tritylamines are useful tools in the organic synthesis. Moreover, BTM is the main reagent in the regioselective cleavage of cyclic acetals, a reaction of great importance for carbohydrate chemistry. Recent innovative applications of BTM, such as CO₂ utilization as feedstock and radical chemistry by photocatalysis, have extended their usefulness in new reactions. The present review is focused on the applications of borane–trimethylamine complex as a reagent in organic synthesis and has not been covered in previous reviews regarding amine–borane complexes. Full article

This study reports the chemical vapor deposition of amorphous boron carbonitride films on Si(100) and SiO₂ substrates using a trimethylamine borane and nitrogen mixture. BC_xN_y films with different compositions were produced via variations in substrate temperature and type of gas-phase activation. The low-pressure chemical vapor deposition (LPCVD) and plasma-enhanced chemical vapor deposition (PECVD) methods were used. The “elemental composition—chemical bonding state—properties” relationship of synthesized BC_xN_y was systematically studied. The hydrophilicity, mechanical, and optical properties of the films are discussed in detail. The composition of films deposited by the LPCVD method at temperatures ranging from 673 to 973 K was close to that of boron carbide with a low nitrogen content (BC_xN_y). The refractive index of these films changed in the range from 2.43 to 2.56 and increased with temperature. The transparency of these films achieved 85%. LPCVD films were hydrophilic and the water contact angles varied between 53 and 63°; the surface free energy was 42–48 mN/m. The microhardness, Young’s modulus and elastic recovery of LPCVD films ranged within 24–28 GPa, 220–247 GPa, and 70–74%, respectively. The structure of the PECVD films was close to that of hexagonal boron nitride, and their composition can be described by the BC_xN_yO_z:H formula. In case of the PECVD process, the smooth films were only produced at low deposition temperatures (373–523 K). The refractive index of these films ranged from 1.51 to 1.67. The transparency of these films achieved 95%; the optical band gap was evaluated as 4.92–5.28 eV. Unlike LPCVD films, they were very soft, and their microhardness, Young’s modulus and elastic recovery were 0.8–1.4 GPa, 25–26 GPa, and 19–28%, respectively. A set of optimized process parameters to fabricate LPCVD BC_xN_y films with improved mechanical and PECVD films with high transparency is suggested. Full article