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Keywords = mask-free nano-LED lithography

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12 pages, 5212 KB  
Article
Developments in Mask-Free Singularly Addressable Nano-LED Lithography
by Martin Mikulics, Andreas Winden, Joachim Mayer and Hilde Helen Hardtdegen
Nanomanufacturing 2024, 4(2), 99-110; https://doi.org/10.3390/nanomanufacturing4020007 - 22 Apr 2024
Cited by 6 | Viewed by 3118
Abstract
LED devices are increasingly gaining importance in lithography approaches due to the fact that they can be used flexibly for mask-less patterning. In this study, we briefly report on developments in mask-free lithography approaches based on nano-LED devices and summarize our current achievements [...] Read more.
LED devices are increasingly gaining importance in lithography approaches due to the fact that they can be used flexibly for mask-less patterning. In this study, we briefly report on developments in mask-free lithography approaches based on nano-LED devices and summarize our current achievements in the different building blocks needed for its application. Individually addressable nano-LED structures can form the basis for an unprecedented fast and flexible patterning, on demand, in photo-chemically sensitive films. We introduce a driving scheme for nano-LEDs in arrays serving for a singularly addressable approach. Furthermore, we discuss the challenges facing nano-LED fabrication and possibilities to improve their performance. Additionally, we introduce LED structures based on a hybrid nanocrystal/nano-LED approach. Lastly, we provide an outlook how this approach could further develop for next generation lithography systems. This technique has a huge potential to revolutionize the field and to contribute significantly to energy and resources saving device nanomanufacturing. Full article
(This article belongs to the Special Issue Feature Papers for Nanomanufacturing in 2023)
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