Search Results (5)

The present manuscript describes the fabrication of microcrystalline silicon (µc-Si) thin films at room temperature using the ionized physical vapor deposition (iPVD) process. The iPVD chamber incorporates a planar DC magnetron and an additional RF coil to generate an intermediate dense plasma region between the target and the substrate. The intermediate dense plasma enhances the ionization of sputtered neutral Si atoms before deposition in the iPVD process. This process greatly impacts the structural, morphological, and optical characteristics of the Si thin films. X-ray diffraction (XRD) reveals that conventional PVD produces an amorphous Si thin film, while iPVD yields a µc-Si thin film with peaks at 28.5° and 47.3°, corresponding to the (111) and (220) planes of Si. Raman spectroscopy confirms the microcrystalline nature of the Si thin film, showing approximately 70% crystallinity in the iPVD process. FESEM images display a granular structure for PVD and a cauliflower-like structure for the iPVD process. AFM images indicate a significant reduction in surface roughness for iPVD films compared to the PVD process. UV-Visible absorption spectroscopy shows that the optical band gap (Eg) decreases from (1.7 ± 0.08) eV to (1.4 ± 0.05) eV while shifting from the PVD to iPVD process. Full article

Purpose: To evaluate the effect of high-silica coating deposited by high-silica physical vapor deposition (PVD) as a chemical bonding method on resin-zirconia bond strength under different aging conditions. Methods: Twelve Y-TZP blocks were used as the substrates. Four resin cement stubs were bonded on each Y-TZP block, with a total number of 48 resin cement stubs. Two test groups (n = 24) were evaluated: conventional Tribochemical silica-coating (TSC) and high-silica PVD with high ionization sputtering processing. Experimental silane primer (MPS) was brushed over the surface treated Y-TZP blocks, then a polyethylene mold was placed over the coated Y-TZP blocks and filled with the adhesive resin cement, then light-cured for 40 s. The shear bond strength (SBS) was then evaluated in dry condition and after thermo-cycling for 6000 cycles. Surface roughness, mode of failure, surface topography and elemental analysis were also evaluated. Results: In dry condition, PVD-coated zirconia specimens showed significantly higher mean SBS values (11.7 ± 1.3 MPa) compared to TSC (10.2 ± 1.1 MPa) (p = 0.027). The SBS values of TSC and PVD-coated samples after thermo-cycling were higher than in dry condition, but with no statistical significant difference (p > 0.05). Tetragonal-to-monoclinic phase transformation was detected in TSC, but not in PVD-coated zirconia. Significant decrease in surface roughness of PVD samples compared to TSC samples (p < 0.001). The silica content in PVD coating was 51% as detected by EDX. Conclusions: High-silica PVD coating on zirconia can give a reliable resin-zirconia chemical bond without any phase transformation and surface destruction by conventional grit-blasting. Full article

The bioactive and anti-bacterial Cu-based bioceramic TiO₂ coatings have been fabricated on cp-Ti (Grade 2) by two-steps. These two-steps combine micro-arc oxidation (MAO) and physical vapor deposition–thermal evaporation (PVD-TE) techniques for dental implant applications. As a first step, all surfaces of cp-Ti substrate were coated by MAO technique in an alkaline electrolyte, consisting of Na₃PO₄ and KOH in de-ionized water. Then, as a second step, a copper (Cu) nano-layer with 5 nm thickness was deposited on the MAO by PVD-TE technique. Phase structure, morphology, elemental amounts, thickness, roughness and wettability of the MAO and Cu-based MAO coating surfaces were characterized by XRD (powder- and TF-XRD), SEM, EDS, eddy current device, surface profilometer and contact angle goniometer, respectively. The powder- and TF-XRD spectral analyses showed that Ti, TiO₂, anatase-TiO₂ and rutile-TiO₂ existed on the MAO and Cu-based MAO coatings’ surfaces. All coatings’ surfaces were porous and rough, owing to the presence of micro sparks through MAO. Furthermore, the surface morphology of Cu-based MAO was not changed. Also, the Cu-based MAO coating has more hydrophilic properties than the MAO coating. In vitro bioactivity and in vitro antibacterial properties of the coatings have been investigated by immersion in simulated body fluid (SBF) at 36.5 °C for 28 days and bacterial adhesion for gram-positive (S. aureus) and gram-negative (E. coli) bacteria, respectively. The apatite layer was formed on the MAO and Cu-based MAO surfaces at post-immersion in SBF and therefore, the bioactivity of Cu-based MAO surface was increased to the MAO surface. Also, for S. aureus and E. coli, the antibacterial properties of Cu-based MAO coatings were significantly improved compared to one of the uncoated MAO surfaces. These results suggested that Cu-based MAO coatings on cp-Ti could be a promising candidate for biomedical dental implant applications. Full article

Physical vapour deposition (PVD) is a well-known technology that is widely used for the deposition of thin films regarding many demands, namely tribological behaviour improvement, optical enhancement, visual/esthetic upgrading, and many other fields, with a wide range of applications already being perfectly established. Machining tools are, probably, one of the most common applications of this deposition technique, sometimes used together with chemical vapour deposition (CVD) in order to increase their lifespan, decreasing friction, and improving thermal properties. However, the CVD process is carried out at higher temperatures, inducing higher stresses in the coatings and substrate, being used essentially only when the required coating needs to be deposited using this process. In order to improve this technique, several studies have been carried out optimizing the PVD technique by increasing plasma ionization, decreasing dark areas (zones where there is no deposition into the reactor), improving targets use, enhancing atomic bombardment efficiency, or even increasing the deposition rate and optimizing the selection of gases. These studies reveal a huge potential in changing parameters to improve thin film quality, increasing as well the adhesion to the substrate. However, the process of improving energy efficiency regarding the industrial context has not been studied as deeply as required. This study aims to proceed to a review regarding the improvements already studied in order to optimize the sputtering PVD process, trying to relate these improvements with the industrial requirements as a function of product development and market demand. Full article

Hydrogen-free diamond-like carbon (DLC) thin films are attractive for a wide range of industrial applications. One of the challenges related to the use of hard DLC lies in the high intrinsic compressive stresses that limit the film adhesion. Here, we report on the mechanical and tribological properties of DLC films deposited by High Power Impulse Magnetron Sputtering (HiPIMS) with Ne as the process gas. In contrast to standard magnetron sputtering as well as standard Ar-based HiPIMS process, the Ne-HiPIMS lead to dense DLC films with increased mass density (up to 2.65 g/cm³) and a hardness of 23 GPa when deposited on steel with a Cr + CrN adhesion interlayer. Tribological testing by the pin-on-disk method revealed a friction coefficient of 0.22 against steel and a wear rate of 2 × 10⁻¹⁷ m³/Nm. The wear rate is about an order of magnitude lower than that of the films deposited using Ar. The differences in the film properties are attributed to an enhanced C ionization in the Ne-HiPIMS discharge. Full article