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Keywords = dismutation reaction silane synthesis

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13 pages, 4060 KiB  
Article
Promising Catalyst for Chlorosilane Dismutation
by Olesya Zhuchok, Yegor Stolmakov, Alexandra Kalinina, Vitaly Medov, Darya Belousova, Nikita Maleev and Georgy Mochalov
Sci 2024, 6(3), 38; https://doi.org/10.3390/sci6030038 - 1 Jul 2024
Viewed by 1312
Abstract
Currently, the most common method of silane synthesis for electronics and photovoltaics is trichlorosilane dismutation. Therefore, an experimental study of the kinetics of the dismutation reaction of chlorosilanes is of scientific and practical interest. A catalyst has been proposed that allows the dismutation [...] Read more.
Currently, the most common method of silane synthesis for electronics and photovoltaics is trichlorosilane dismutation. Therefore, an experimental study of the kinetics of the dismutation reaction of chlorosilanes is of scientific and practical interest. A catalyst has been proposed that allows the dismutation reaction to be carried out in a wide range of temperatures and pressures. Both kinetic and thermodynamic data on the dependence of the rate of the dismutation reactions of trichlorosilane, dichlorosilane, and monochlorosilane on pressure were experimentally obtained. In addition, the dependence of saturated vapor pressure on temperature for monochlorosilane and dichlorosilane were also experimentally determined. Using the example of TCS, it was experimentally established that increasing the pressure to six atmospheres makes it possible to increase the specific productivity of the reactor by at least an order of magnitude due to the acceleration of the chemical reaction and the increase in the molar concentration of chlorosilanes in the vapor mixture. Consequently, it becomes possible to multiply the reactor’s load on the substance and, accordingly, the performance of the chlorosilane dismutation apparatus in general. Full article
(This article belongs to the Section Chemistry Science)
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17 pages, 3821 KiB  
Article
Thermodynamics and Kinetics of the Reaction of Catalytic Dismutation of Chlorosilanes in the Vapor Phase in the Temperature Range of 353–393 K
by Georgy Mochalov, Yegor Stolmakov and Olesya Zhuchok
ChemEngineering 2023, 7(1), 13; https://doi.org/10.3390/chemengineering7010013 - 10 Feb 2023
Cited by 4 | Viewed by 2861
Abstract
Currently, the most common method of silane synthesis for electronics and photovoltaics is trichlorosilane (TS) dismutation. TS dismutation proceeds in the form of a reactions cascade, therefore its study is of both practical and scientific interest. The results of calculating the equilibrium composition [...] Read more.
Currently, the most common method of silane synthesis for electronics and photovoltaics is trichlorosilane (TS) dismutation. TS dismutation proceeds in the form of a reactions cascade, therefore its study is of both practical and scientific interest. The results of calculating the equilibrium composition of the reaction mixture in the vapor phase based on literature data from various sources were not reliable. Therefore, the dependence of the composition of the reaction mixture on the time of contact of the TS vapor with the catalyst under static conditions was experimentally investigated. The stationary composition of the mixture, close to equilibrium, was determined. A good agreement of the obtained results with the literature data in one of the sources was shown. The kinetics of the dismutation reaction of TS and dichlorosilane (DCS) was carried out by the flow method. As a result of regression analysis of experimental data, the rate constants of the direct and reverse dismutation reactions of TS, DCS, and monochlorosilane (MSC) were obtained. The rate constants were used to calculate the equilibrium composition of the reaction mixture. A good agreement between the calculated and experimental data was shown. Full article
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