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Keywords = EUV ptychography

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13 pages, 3806 KiB  
Article
Impact of Sn Particle-Induced Mask Diffraction on EUV Lithography Performance Across Different Pattern Types
by Seungchan Moon, Dong Gi Lee, Jinhyuk Choi, Junho Hong, Taeho Lee, Yasin Ekinci and Jinho Ahn
Photonics 2025, 12(3), 266; https://doi.org/10.3390/photonics12030266 - 14 Mar 2025
Cited by 1 | Viewed by 1628
Abstract
This study investigates the differences in the lithographic impact of particles on the pellicle surface depending on the type of extreme ultraviolet (EUV) mask pattern. Using an EUV ptychography microscope, we analyzed how mask imaging performance is affected by locally obstructed mask diffraction [...] Read more.
This study investigates the differences in the lithographic impact of particles on the pellicle surface depending on the type of extreme ultraviolet (EUV) mask pattern. Using an EUV ptychography microscope, we analyzed how mask imaging performance is affected by locally obstructed mask diffraction caused by a 10 μm × 10 μm patterned tin particle intentionally fabricated on the pellicle surface. The resulting critical dimension variations were found to be approximately three times greater in line-and-space patterns than in contact hole patterns. Based on these findings, we recommend defining the critical size of particles according to the mask pattern type to optimize lithographic quality. Full article
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22 pages, 5356 KiB  
Article
Lensless Reflection Imaging of Obliquely Illuminated Objects I: Choosing a Domain for Phase Retrieval and Ptychography
by Igor A. Artyukov, Nikolay L. Popov and Alexander V. Vinogradov
Symmetry 2021, 13(8), 1439; https://doi.org/10.3390/sym13081439 - 5 Aug 2021
Cited by 3 | Viewed by 2461
Abstract
Ptychography is a lensless imaging technology that is validated from hard X-rays to terahertz spectral range. It is most attractive for extreme ultraviolet (EUV) and X-rays as optical elements are expensive and often not available. Typically, the set up involves coherently illuminated object [...] Read more.
Ptychography is a lensless imaging technology that is validated from hard X-rays to terahertz spectral range. It is most attractive for extreme ultraviolet (EUV) and X-rays as optical elements are expensive and often not available. Typically, the set up involves coherently illuminated object that directs the scattered radiation normally to detector which is parallel to the object plane. Computer processing of diffraction patterns obtained when scanning the object gives the image, more precisely, the distribution of intensity and phase on its surface. However, this scheme is inefficient for EUV and X-rays due to poor reflectivity and low penetration in all materials. Reflection mode ptychography solves the problem if illumination angles do not exceed the critical angle of object material. Changing the geometry of experiment changes physical and mathematical model of image formation. Including: diffraction integral describing beam propagation from object to detector, inverse problem, optimization of object illumination angle, position and orientation of detector, choosing size and grid of coordinate and frequency computer domains. This paper considers the wavefield scattered to detector by obliquely illuminated object and determines a domain for processing of obtained scans. Solution of inverse problem with phase retrieval and resulting numerical images will be presented in the next paper. Full article
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