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Authors = Joakim Reuteler

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7 pages, 4983 KiB  
Article
Xenon Plasma Focused Ion Beam Milling for Obtaining Soft X-ray Transparent Samples
by Sina Mayr, Simone Finizio, Joakim Reuteler, Stefan Stutz, Carsten Dubs, Markus Weigand, Aleš Hrabec, Jörg Raabe and Sebastian Wintz
Crystals 2021, 11(5), 546; https://doi.org/10.3390/cryst11050546 - 14 May 2021
Cited by 6 | Viewed by 3468
Abstract
We employ xenon (Xe) plasma focused ion beam (PFIB) milling to obtain soft X-ray transparent windows out of bulk samples. The use of a Xe PFIB allows for the milling of thin windows (several 100 nm thick) with areas of the order of [...] Read more.
We employ xenon (Xe) plasma focused ion beam (PFIB) milling to obtain soft X-ray transparent windows out of bulk samples. The use of a Xe PFIB allows for the milling of thin windows (several 100 nm thick) with areas of the order of 100 µm × 100 µm into bulk substrates. In addition, we present an approach to empirically determine the transmission level of such windows during fabrication by correlating their electron and soft X-ray transparencies. We perform scanning transmission X-ray microscopy (STXM) imaging on a sample obtained by Xe PFIB milling to demonstrate the conceptual feasibility of the technique. Our thinning approach provides a fast and simplified method for facilitating soft X-ray transmission measurements of epitaxial samples and it can be applied to a variety of different sample systems and substrates that are otherwise not accessible. Full article
(This article belongs to the Special Issue Advanced Imaging Methods)
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