Kim, K.; Park, K.; Nam, H.; Kim, G.H.; Hong, S.K.; Kim, S.; Woo, H.; Yoon, S.; Kim, J.H.; Lim, G.
Fabrication of Oblique Submicron-Scale Structures Using Synchrotron Hard X-ray Lithography. Polymers 2021, 13, 1045.
https://doi.org/10.3390/polym13071045
AMA Style
Kim K, Park K, Nam H, Kim GH, Hong SK, Kim S, Woo H, Yoon S, Kim JH, Lim G.
Fabrication of Oblique Submicron-Scale Structures Using Synchrotron Hard X-ray Lithography. Polymers. 2021; 13(7):1045.
https://doi.org/10.3390/polym13071045
Chicago/Turabian Style
Kim, Kanghyun, Kyungjin Park, Hyoryung Nam, Geon Hwee Kim, Seong Kyung Hong, Suhyeon Kim, Hyeonsu Woo, Seungbin Yoon, Jong Hyun Kim, and Geunbae Lim.
2021. "Fabrication of Oblique Submicron-Scale Structures Using Synchrotron Hard X-ray Lithography" Polymers 13, no. 7: 1045.
https://doi.org/10.3390/polym13071045
APA Style
Kim, K., Park, K., Nam, H., Kim, G. H., Hong, S. K., Kim, S., Woo, H., Yoon, S., Kim, J. H., & Lim, G.
(2021). Fabrication of Oblique Submicron-Scale Structures Using Synchrotron Hard X-ray Lithography. Polymers, 13(7), 1045.
https://doi.org/10.3390/polym13071045