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Journal: Crystals, 2022
Volume: 12
Number: 78
Article:
Tailoring Properties of Hafnium Nitride Thin Film via Reactive Gas-Timing RF Magnetron Sputtering for Surface Enhanced-Raman Scattering Substrates
Authors:
by
Nguentra Sucheewa, Winadda Wongwiriyapan, Annop Klamchuen, Michiko Obata, Masatsugu Fujishige, Kenji Takeuchi, Tossaporn Lertvanithphol, Tuksadon Wutikhun, Saifon Kullyakool, Wanwalee Auttasiri, Nataporn Sowasod, Theerayut Prataen, Wiwut Tanthapanichakoon and Jiti Nukeaw
Link:
https://www.mdpi.com/2073-4352/12/1/78
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