Article Versions Notes

Kim KJ, Kamada K, Murakami R, Horiai T, Ishikawa S, Kochurikhin VV, Yoshino M, Yamaji A, Shoji Y, Kurosawa S, et al. Growth of Lu₂O₃ and HfO₂ Based High Melting Temperature Single Crystals by Indirect Heating Method Using Arc Plasma. Crystals. 2020; 10(7):619. https://doi.org/10.3390/cryst10070619

Kim, Kyoung Jin, Kei Kamada, Rikito Murakami, Takahiko Horiai, Shiori Ishikawa, Vladimir V. Kochurikhin, Masao Yoshino, Akihiro Yamaji, Yasuhiro Shoji, Shunsuke Kurosawa, and et al. 2020. "Growth of Lu₂O₃ and HfO₂ Based High Melting Temperature Single Crystals by Indirect Heating Method Using Arc Plasma" Crystals 10, no. 7: 619. https://doi.org/10.3390/cryst10070619

Kim, K. J., Kamada, K., Murakami, R., Horiai, T., Ishikawa, S., Kochurikhin, V. V., Yoshino, M., Yamaji, A., Shoji, Y., Kurosawa, S., Toyoda, S., Sato, H., Yokota, Y., Ohashi, Y., & Yoshikawa, A. (2020). Growth of Lu₂O₃ and HfO₂ Based High Melting Temperature Single Crystals by Indirect Heating Method Using Arc Plasma. Crystals, 10(7), 619. https://doi.org/10.3390/cryst10070619