Sign in to use this feature.

Years

Between: -

Subjects

remove_circle_outline
remove_circle_outline
remove_circle_outline

Journals

Article Types

Countries / Regions

Search Results (3)

Search Parameters:
Keywords = optical phonon replicas

Order results
Result details
Results per page
Select all
Export citation of selected articles as:
19 pages, 9100 KiB  
Article
Deep Ultraviolet Excitation Photoluminescence Characteristics and Correlative Investigation of Al-Rich AlGaN Films on Sapphire
by Zhe Chuan Feng, Ming Tian, Xiong Zhang, Manika Tun Nafisa, Yao Liu, Jeffrey Yiin, Benjamin Klein and Ian Ferguson
Nanomaterials 2024, 14(21), 1769; https://doi.org/10.3390/nano14211769 - 4 Nov 2024
Viewed by 1434
Abstract
AlGaN is attractive for fabricating deep ultraviolet (DUV) optoelectronic and electronic devices of light-emitting diodes (LEDs), photodetectors, high-electron-mobility field-effect transistors (HEMTs), etc. We investigated the quality and optical properties of AlxGa1−xN films with high Al fractions (60–87%) grown on [...] Read more.
AlGaN is attractive for fabricating deep ultraviolet (DUV) optoelectronic and electronic devices of light-emitting diodes (LEDs), photodetectors, high-electron-mobility field-effect transistors (HEMTs), etc. We investigated the quality and optical properties of AlxGa1−xN films with high Al fractions (60–87%) grown on sapphire substrates, including AlN nucleation and buffer layers, by metal–organic chemical vapor deposition (MOCVD). They were initially investigated by high-resolution X-ray diffraction (HR-XRD) and Raman scattering (RS). A set of formulas was deduced to precisely determine x(Al) from HR-XRD data. Screw dislocation densities in AlGaN and AlN layers were deduced. DUV (266 nm) excitation RS clearly exhibits AlGaN Raman features far superior to visible RS. The simulation on the AlGaN longitudinal optical (LO) phonon modes determined the carrier concentrations in the AlGaN layers. The spatial correlation model (SCM) analyses on E2(high) modes examined the AlGaN and AlN layer properties. These high-x(Al) AlxGa1−xN films possess large energy gaps Eg in the range of 5.0–5.6 eV and are excited by a DUV 213 nm (5.8 eV) laser for room temperature (RT) photoluminescence (PL) and temperature-dependent photoluminescence (TDPL) studies. The obtained RTPL bands were deconvoluted with two Gaussian bands, indicating cross-bandgap emission, phonon replicas, and variation with x(Al). TDPL spectra at 20–300 K of Al0.87Ga0.13N exhibit the T-dependences of the band-edge luminescence near 5.6 eV and the phonon replicas. According to the Arrhenius fitting diagram of the TDPL spectra, the activation energy (19.6 meV) associated with the luminescence process is acquired. In addition, the combined PL and time-resolved photoluminescence (TRPL) spectroscopic system with DUV 213 nm pulse excitation was applied to measure a typical AlGaN multiple-quantum well (MQW). The RT TRPL decay spectra were obtained at four wavelengths and fitted by two exponentials with fast and slow decay times of ~0.2 ns and 1–2 ns, respectively. Comprehensive studies on these Al-rich AlGaN epi-films and a typical AlGaN MQW are achieved with unique and significant results, which are useful to researchers in the field. Full article
Show Figures

Figure 1

10 pages, 1831 KiB  
Article
The Wannier-Mott Exciton, Bound Exciton, and Optical Phonon Replicas of Single-Crystal GaSe
by Long V. Le, Tran Thi Thu Huong, Tien-Thanh Nguyen, Xuan Au Nguyen, Thi Huong Nguyen, Sunglae Cho, Young Dong Kim and Tae Jung Kim
Crystals 2024, 14(6), 539; https://doi.org/10.3390/cryst14060539 - 8 Jun 2024
Viewed by 1796
Abstract
We report the absorption and photoluminescence spectra of GaSe single crystals in the near-edge region. The temperatures explored the range from 17 to 300 K. Specifically, at a temperature of 17 K, the photoluminescence spectrum reveals an interesting phenomenon: the Wannier-Mott exciton separates [...] Read more.
We report the absorption and photoluminescence spectra of GaSe single crystals in the near-edge region. The temperatures explored the range from 17 to 300 K. Specifically, at a temperature of 17 K, the photoluminescence spectrum reveals an interesting phenomenon: the Wannier-Mott exciton separates into two states. These states are a triplet state with an energy of 2.103 eV and a singlet state with an energy of 2.109 eV. The energy difference between these two states is 6 meV. Furthermore, the bound exciton (BX) can be localized at an energy of 2.093 eV. It is worth noting that its phonon replicas (BX-nLO) can be clearly distinguished up to the fourth order. Interestingly, the energy gaps between these replicas exhibit a consistent spacing of 7 ± 0.5 meV. This intriguing finding suggests a high-quality crystalline structure as well as a strong coupling between the phonon and BX-nLO. Additionally, at low temperatures, both the ground state (n = 1) at 2.11 eV and the excited state (n = 2) at 2.127 eV of free excitons can be observed. Full article
(This article belongs to the Topic Optoelectronic Materials, 2nd Volume)
Show Figures

Figure 1

15 pages, 4042 KiB  
Article
Effect of Plasma Treatment on the Luminescent and Scintillation Properties of Thick ZnO Films Fabricated by Sputtering of a Hot Ceramic Target
by Andrey P. Tarasov, Abubakar M. Ismailov, Makhach Kh. Gadzhiev, Ivan D. Venevtsev, Arsen E. Muslimov, Ivan S. Volchkov, Samira R. Aidamirova, Alexandr S. Tyuftyaev, Andrey V. Butashin and Vladimir M. Kanevsky
Photonics 2023, 10(12), 1354; https://doi.org/10.3390/photonics10121354 - 8 Dec 2023
Cited by 4 | Viewed by 1442
Abstract
The paper presents the results of a comprehensive study of the structural-phase composition, morphology, optical, luminescent, and scintillation characteristics of thick ZnO films fabricated by magnetron sputtering. By using a hot ceramic target, extremely rapid growth (~50 µm/h) of ZnO microfilms more than [...] Read more.
The paper presents the results of a comprehensive study of the structural-phase composition, morphology, optical, luminescent, and scintillation characteristics of thick ZnO films fabricated by magnetron sputtering. By using a hot ceramic target, extremely rapid growth (~50 µm/h) of ZnO microfilms more than 100 µm thick was performed, which is an advantage for the industrial production of scintillation detectors. The effects of post-growth treatment of the fabricated films in low-temperature plasma were studied and a significant improvement in their crystalline and optical quality was shown. As a result, the films exhibit intense near-band-edge luminescence in the near-UV region with a decay time of <1 ns. Plasma treatment also allowed to significantly weaken the visible defect luminescence excited in the near-surface regions of the films. A study of the luminescence mechanisms in the synthesized films revealed that their near-band-edge emission at room temperature is formed by phonon replicas of free exciton recombination emission. Particularly, the first phonon replica plays the main role in the case of optical excitation, while upon X-ray excitation, the second phonon replica dominates. It was also shown that the green band peaking at ~510 nm (2.43 eV) is due to surface emission centers, while longer wavelength (>550 nm) green-yellow emission originates mainly from bulk parts of the films. Full article
Show Figures

Figure 1

Back to TopTop