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Keywords = ELP and EP

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12 pages, 3170 KB  
Article
Electroless Pd Nanolayers for Low-Temperature Hybrid Cu Bonding Application: Comparative Analysis with Electroplated Pd Nanolayers
by Dongmyeong Lee, Byeongchan Go, Keiyu Komamura and Sarah Eunkyung Kim
Electronics 2025, 14(19), 3814; https://doi.org/10.3390/electronics14193814 - 26 Sep 2025
Viewed by 472
Abstract
As 3D stacking technologies advance, low-temperature hybrid Cu bonding has become essential for fine-pitch integration. This study focuses on evaluating Pd nanolayers deposited by electroless plating (ELP) on Cu surfaces and compares them to electroplated (EP) Pd to assess their suitability for hybrid [...] Read more.
As 3D stacking technologies advance, low-temperature hybrid Cu bonding has become essential for fine-pitch integration. This study focuses on evaluating Pd nanolayers deposited by electroless plating (ELP) on Cu surfaces and compares them to electroplated (EP) Pd to assess their suitability for hybrid bonding. Pd nanolayers (5~7 nm) were deposited on Cu films, and their surface morphology, crystallinity, and chemical composition were characterized using AFM, TEM, GIXRD, and XPS. EP-Pd layers exhibited lower roughness and larger grain size, acting as effective Cu diffusion barriers. In contrast, ELP-Pd layers showed small grains, higher surface roughness, and partial Cu diffusion and oxidation. At 200 °C, both Pd layers enabled bonding, but ELP-Pd samples achieved more uniform and continuous interfaces with thinner copper oxide layers. Shear testing revealed that ELP-Pd samples exhibited higher average bonding strength (20.58 MPa) and lower variability compared to EP-Pd (16.47 MPa). The improved bonding performance of ELP-Pd is attributed to its grain-boundary-driven diffusion and uniform interface formation. These findings highlight the potential of electroless Pd as a passivation layer for low-temperature hybrid Cu bonding and underscore the importance of optimizing pre-bonding surface treatments for improved bonding quality. Full article
(This article belongs to the Section Electronic Materials, Devices and Applications)
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12 pages, 6046 KB  
Article
Microstructural Investigation and On-Site Repair of Thin Pd-Ag Alloy Membranes
by Yuyu Ma, Chunhua Tang, Feng Bao, Wei Shao, Tianying Xu, Hui Li and Hengyong Xu
Membranes 2020, 10(12), 384; https://doi.org/10.3390/membranes10120384 - 30 Nov 2020
Cited by 12 | Viewed by 2787
Abstract
Pd membranes act in an important role in H2 purification and H2 production in membrane reactors. Pd-Ag alloy membranes fabricated by consecutive electroless- and electroplating process on alumina tubes exhibited good stability under stringent heating/cooling cycles at a ramp rate of 10 K/min, [...] Read more.
Pd membranes act in an important role in H2 purification and H2 production in membrane reactors. Pd-Ag alloy membranes fabricated by consecutive electroless- and electroplating process on alumina tubes exhibited good stability under stringent heating/cooling cycles at a ramp rate of 10 K/min, imitating practical fast initiation or emergency shutdown conditions. Bilayer Pd-Ag membranes can form dense and uniform alloy after thermal treatment for 24 h at 823 K under H2 atmosphere, despite a porous structure due to the development of liquid-like properties above Tamman temperature to enforce the migrativity. On the contrary, alloying under N2 atmosphere resulted in a Pd-enriched layer. This led to a lower H2 flux but superior thermal stability compared to that alloying under H2 atmosphere. The trilayer approach of electroless-plated Pd, electro-polated Ag and electroless-plated Pd is not suitable to achieve homogeneous Pd-Ag alloys, which, on the other hand, presented the occurrence of a small gap between top Pd layer and middle Ag layer, probably due to insufficient wetting during plating process. An on-site repair treatment in analogous to MOCVD (Metal-organic Chemical Vapor Deposition) process was first proposed to extend the lifetime of Pd-Ag membrane, i.e., by vaporizing, and subsequent decomposition of Ag(OOCC2F5) powders to “preferentially” block the pinholes under vacuum and at working temperature of ca. 473–673 K, which effectively reduced the N2 flux by 57.4% compared to the initial value. The H2 flux, however, declined by 16.7% due to carbon deposition on the membrane surface, which requires further investigation. This approach shows some potential for on-site repair without disassembly or cooling to room temperature. Full article
(This article belongs to the Special Issue Membranes: 10th Anniversary)
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