Special Issue "Microplasma Devices"
A special issue of Micromachines (ISSN 2072-666X).
Deadline for manuscript submissions: 15 June 2017
Prof. Dr. Massood Tabib-Azar
The main purpose of this Issue is to discuss through its invited and contributed articles, miniaturized plasma devices with applications in sensing, actuation, harsh environment signal processing, terahertz signal processing, material processing (deposition, etching and modification), and in medicine.
Plasmas offers many interesting properties that include very low resistance, an ability to carry very large current densities, offer partially charged beams for electro-magnetic field sensing and actuation, has unique ionized material-dependent photoemission for chemical analysis, the ability to decompose materials and biological tissues, bacteria and viruses, and to deposit and process materials. Plasmas come in many different forms: high density plasmas, low density plasmas, “dirty” plasmas, low pressure and high pressure plasmas, magnetized plasmas, to name a few.
Although in most cases plasma devices are quite large with today’s microelectronic devices standards, they do not have to be. There are some advantages in miniaturizing plasma devices that include lowering the operation voltages, integration with other devices or circuits, realizing addressable arrays, or simple arrays for energy management, parallel detection of different substances through their photoemission in a plasma array, plasma array devices to modify gas boundary conditions for propulsion, sensing and treatment, to name a few. Miniaturized plasma switches are extensively used in flashes and in many high power switching applications. Plasma displays are very popular for their very sharp images and visibility under direct sunlight.
In traveling and slow wave structures, charged plasmas can be used instead of electron beams to increase the device breakdown voltage and to take advantage of self-focusing nature of the plasmas to modify the need for magnetic field focusing that makes them bulky and heavy.
In medicine, plasmas are used for elimination of drug resistant bacteria, skin and tissue treatment, etc. Some have shown that plasma treatment results in faster healing of wounds.
We are inviting all the researchers in the wide area of micro-plasma devices to contribute to this Special Issue.
Prof. Dr. Massood Tabib-Azar
Manuscript Submission Information
Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All papers will be peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.
Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Micromachines is an international peer-reviewed open access monthly journal published by MDPI.
Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 1000 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.
• microfabricated plasma devices
• plasma switches
• plasma sensors
• plasma actuators
The below list represents only planned manuscripts. Some of these manuscripts have not been received by the Editorial Office yet. Papers submitted to MDPI journals are subject to peer-review.
Title: DC microplasma jet for local a:C-H deposition operated in SEM chamber
Authors: Khanit Matra, Hiroshi Furuta and Akimitsu Hatta
Abstract: A DC micro plasma jet for local micro deposition of a:C-H film in the ambient vacuum of scanning electron microscope (SEM) chamber is proposed. An anode gas nozzle made of 1/8 inch stainless steel tube with a 30µm orifice at a closed end was inserted into the SEM chamber. Acetylene (C2H2) gas was locally fed into the chamber through the anode nozzle at 6.6 sccm in flow rate by applying 80kPa-pressure with direct pumping out by an additional turbo molecular pump equipped on the SEM chamber. As a cathode, a cut of n-type silicon (Si) wafer was placed right in front of the anode nozzle at 200µm gap distance. By applying a positive DC voltage to the anode nozzle, C2H2 plasma was generated locally between the electrodes. After ignition of discharge, the voltage increased and the current decreased due to deposition of insulating film on the Si wafer with resulting in automatic termination of discharge at the constant source voltage. A practically symmetric mountain-shaped a:C-H film of 5µm in thickness at the center was obtained by operation for 15s. Films are deposited with variation of gas flow rate, gap distance, voltage and current, and deposition time. The films are directly observed by SEM and analyzed by surface profile meter and by Raman Spectroscopy.
Keywords: Micro plasma jet; C2H2 plasma; thin film deposition