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Micromachines 2017, 8(6), 173; doi:10.3390/mi8060173

Separated Type Atmospheric Pressure Plasma Microjets Array for Maskless Microscale Etching

1
Department of Precision Machinery and Instrumentation, University of Science and Technology of China, Hefei 230026, China
2
School of Mechanical and Automotive Engineering, Anhui Polytechnic University, Wuhu 241000, China
*
Author to whom correspondence should be addressed.
Academic Editor: Massood Tabib-Azar
Received: 26 March 2017 / Revised: 26 April 2017 / Accepted: 10 May 2017 / Published: 1 June 2017
(This article belongs to the Special Issue Microplasma Devices)
View Full-Text   |   Download PDF [4924 KB, uploaded 1 June 2017]   |  

Abstract

Maskless etching approaches such as microdischarges and atmospheric pressure plasma jets (APPJs) have been studied recently. Nonetheless, a simple, long lifetime, and efficient maskless etching method is still a challenge. In this work, a separated type maskless etching system based on atmospheric pressure He/O2 plasma jet and microfabricated Micro Electro Mechanical Systems (MEMS) nozzle have been developed with advantages of simple-structure, flexibility, and parallel processing capacity. The plasma was generated in the glass tube, forming the micron level plasma jet between the nozzle and the surface of polymer. The plasma microjet was capable of removing photoresist without masks since it contains oxygen reactive species verified by spectra measurement. The experimental results illustrated that different features of microholes etched by plasma microjet could be achieved by controlling the distance between the nozzle and the substrate, additive oxygen ratio, and etch time, the result of which is consistent with the analysis result of plasma spectra. In addition, a parallel etching process was also realized by plasma microjets array. View Full-Text
Keywords: atmospheric pressure plasma microjets array; maskless etching; photoresist; MEMS; separation design; parallel processing atmospheric pressure plasma microjets array; maskless etching; photoresist; MEMS; separation design; parallel processing
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MDPI and ACS Style

Dai, Y.; Zhang, M.; Li, Q.; Wen, L.; Wang, H.; Chu, J. Separated Type Atmospheric Pressure Plasma Microjets Array for Maskless Microscale Etching. Micromachines 2017, 8, 173.

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