Special Issue "Design of Nanostructured Materials by Atomic Layer Deposition and Its Applications"

A special issue of Nanomaterials (ISSN 2079-4991).

Deadline for manuscript submissions: 31 July 2018

Special Issue Editors

Guest Editor
Prof. Dr. Mikhael Bechelany

Institut Européen des Membranes de Montpellier(IEMM, UMR 5635, UM, ENSCM, CNRS)Place Eugène Bataillon 34095 MONTPELLIER Cedex 5, France
Website | E-Mail
Interests: atomic layer deposition; ultrathin film; graphene; nanotubes; nanowires; boron nitride; electrospinning; membranes; sensors; biosensors; water treatment; energy; electrodes; tissue engineering; drug delivery
Guest Editor
Prof. Dr. Seppo Honkanen

Institute of Photonics, University of Eastern Finland, Yliopistonranta 1, 70210 Kuopio, Finland
Website | E-Mail
Interests: guided-wave optics; telecommunications application; sensors
Guest Editor
Prof. Dr. Matthieu Roussey

Institute of Photonics, University of Eastern Finland, Yliopistonranta 1, 70210 Kuopio, Finland
Website | E-Mail
Interests: lab-on-chip; lab-on-fiber; integrated telecommunication components; novel waveguide platforms; atomic layer deposition for photonics; SERS; bio-applications

Special Issue Information

Dear Colleagues,

Atomic layer deposition (ALD) is a thin film deposition technique allowing for sub-nanometer thickness control, as well as excellent uniformity and conformality on demanding substrates. Although ALD is typically used for the synthesis of oxides nanomaterials, it has been shown that nitrides and metals can also be prepared using this technique.

This Special Issue will aim at gathering resources in the area of the design of nanostructured materials using ALD for different applications such as health, environment and renewable energy. Contributions related to advanced materials design, novel materials properties and original characterization techniques will be as well considered.

This Special Issue will deal with: (i) the design of nanostructured materials with controlled morphology, geometry and crystallinity, (ii) the tuning of interfaces for the obtained materials, (iii) the study of the dependence of the physical-chemical properties on the geometric parameter, and (iv) the investigation of new applications.

Dr. Mikhael Bechelany
Prof. Dr. Seppo Honkanen
Prof. Dr. Matthieu Roussey
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All papers will be peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Nanomaterials is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 1200 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • thin film
  • nanomaterial
  • interface
  • surface modification
  • nanostructured material
  • energy
  • health
  • environment

Published Papers (1 paper)

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Research

Open AccessArticle Transparent and Flexible Capacitors with an Ultrathin Structure by Using Graphene as Bottom Electrodes
Nanomaterials 2017, 7(12), 418; doi:10.3390/nano7120418
Received: 27 October 2017 / Revised: 17 November 2017 / Accepted: 24 November 2017 / Published: 28 November 2017
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Abstract
Ultrathin, transparent and flexible capacitors using graphene as the bottom electrodes were directly fabricated on polyethylene naphthalate (PEN) substrates. ZrO2 dielectric films were deposited on the treated surface of graphene by atomic layer deposition (ALD). The deposition process did not introduce any
[...] Read more.
Ultrathin, transparent and flexible capacitors using graphene as the bottom electrodes were directly fabricated on polyethylene naphthalate (PEN) substrates. ZrO2 dielectric films were deposited on the treated surface of graphene by atomic layer deposition (ALD). The deposition process did not introduce any detectible defects in the graphene, as indicated by Raman measurements, guaranteeing the electrical performances of the graphene electrodes. The Aluminum-doped zinc oxide (AZO) films were prepared as the top electrodes using the ALD technique. The capacitors presented a high capacitance density (10.3 fF/μm2 at 10 kHz) and a relatively low leakage current (5.3 × 10−6 A/cm2 at 1 V). Bending tests revealed that the capacitors were able to work normally at an outward bending radius of 10 mm without any deterioration of electrical properties. The capacitors exhibited an average optical transmittance of close to 70% at visible wavelengths. Thus, it opens the door to practical applications in transparent integrated circuits. Full article
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