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Metals
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Electrochemical Deposition
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Electrochemical Deposition

A special issue of Metals (ISSN 2075-4701).

Deadline for manuscript submissions: closed (30 May 2019) | Viewed by 11983

Special Issue Editor

Prof. Dr. Giovanni Zangari

E-Mail Website
Guest Editor
Department of Materials Science & EngineeringUniversity of VirginiaPO Box 400745395 McCormick RoadCharlottesville, VA 22904-4745 USA
Interests: functional materials; electrochemistry; electrochemical deposition; energy conversion

Special Issue Information

Dear Colleagues,

Electrochemical deposition is a versatile, efficient, yet simple technique that enables the formation of films, micro- or nano-structures in electrolytic solutions by reduction of metal ions onto a suitable substrate. Metals, alloys, semiconductors, polymers and composites could be obtained, and their structure, morphology as well as functionality could be tailored via the process parameters and the electrolyte chemistry. While industrial processes mostly utilize aqueous electrolytes, researchers and practitioners now have the opportunity to utilize a range of solvents that overcome many of the limitations of aqueous ones, allowing for the electrochemical synthesis of refractory metals as well as a wider range of semiconductor and novel functional materials.

Electrodeposition can be performed under atmospheric conditions and at low temperatures, facilitating integration in electronic manufacturing as well as nanoscale materials and devices for applications in energy conversion and biomedicine among others. In-situ studies of electrodeposition mechanisms have achieved a high level of sophistication and, together with atomistic modeling, can further elucidate and integrate the understanding of fundamental steps in electrodeposition, enabling in turn ever better predictive capabilities and innovations in the field.

This Special Issue seeks to provide a selection of original research, reviews and commentaries focusing on the current trends in electrodeposition and the future of this technology.

A Special Issue, titled “Electrochemical Deposition”, is expected to be prepared and edited in 2018. As a Guest Editor of this Special Issue, I invite you to submit a paper, which will be peer reviewed to be accepted for publication in Metals. The manuscripts are expected by the spring of 2018, with a deadline towards the end of 2018.

Prof. Dr. Giovanni Zangari
Guest Editor

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Metals is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • Electrodeposition
  • Electrochemical deposition
  • Films, alloys, electrolytes, functional materials

Published Papers (3 papers)

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Research

10 pages, 2005 KiB  
Article
Successes and Issues in the Growth of Moad and MoSe2 on Ag(111) by the E-ALD Method
by Martina Vizza, Andrea Giaccherini, Walter Giurlani, Maurizio Passaponti, Nicola Cioffi, Rosaria Anna Picca, Antonio De Luca, Lorenzo Fabbri, Alessandro Lavacchi, Filippo Gambinossi, Emanuele Piciollo, Emanuele Salvietti and Massimo Innocenti
Metals 2019, 9(2), 122; https://doi.org/10.3390/met9020122 - 24 Jan 2019
Cited by 4 | Viewed by 2700
Abstract
This paper explores the conditions for the electrodeposition of Moad (molybdenum adlayer) on Ag(111) from alkaline aqueous solution. Moreover, the first stages of the growth of MoSe2 are also presented, performing the deposition of Sead on the deposited Moad [...] Read more.
This paper explores the conditions for the electrodeposition of Moad (molybdenum adlayer) on Ag(111) from alkaline aqueous solution. Moreover, the first stages of the growth of MoSe2 are also presented, performing the deposition of Sead on the deposited Moad. The deposition of Moad on Sead/Ag(111) was also explored. MoSe2 is of interest due to its peculiar optoelectronic properties, making it suitable for solar energy conversion and nanoelectronics. In this study, electrodeposition techniques were exploited for the synthesis process as more sustainable alternatives to vacuum based techniques. The electrochemical atomic layer deposition (E-ALD) method emerges as a suitable technique to grow inorganic semiconductor thin films thanks to its fulfillment of the green energy predicament and a strict structural and morphological control, and this approach has gathered the attention of the scientific community. Indeed, E-ALD exploits surface limited reactions (SLRs) to alternate the deposition of chemically different atomic layers constituting a compound semiconductor. Thus, E-ALD is one of the most promising electrodeposition techniques for the growth of thin-film of compound semiconductors under a strict structural and morphological control. On this ground, E-ALD can be considered an ideal technique for the growth of 2D materials. Full article
(This article belongs to the Special Issue Electrochemical Deposition)
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8 pages, 5832 KiB  
Article
Effect of Jet Flow between Electrodes on the Cathode Quality in Copper Electrorefining with High Current Density
by Hongdan Wang, Qian Wang, Wentang Xia and Bingzhi Ren
Metals 2018, 8(10), 833; https://doi.org/10.3390/met8100833 - 17 Oct 2018
Cited by 5 | Viewed by 3984
Abstract
Increasing current density is one of the main methods for improving the productivity of copper electrorefining. However, in the conventional bottom-inlet/top-outlet mode, an increase in current density leads to a deterioration of the surface quality of the cathode copper. This paper describes an [...] Read more.
Increasing current density is one of the main methods for improving the productivity of copper electrorefining. However, in the conventional bottom-inlet/top-outlet mode, an increase in current density leads to a deterioration of the surface quality of the cathode copper. This paper describes an experimental study of the influence of the jet flow between electrodes on the cathode quality. The surface roughness and the standard deviation of the cathode copper were used to evaluate the cathode quality. The results showed that in the single-side jet inlet mode, the electrolyte circulation rate has great influence on the surface roughness of the cathode copper, which is inversely correlated. However, when the electrolyte circulation rate is small, the surface roughness of the cathode copper is not uniform. The farther the position at the surface of the cathode copper is to the jet region, the coarser the cathode copper surface, and vice versa. Full article
(This article belongs to the Special Issue Electrochemical Deposition)
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13 pages, 2852 KiB  
Article
Electrodeposition of Fe-C Alloys from Citrate Baths: Structure, Mechanical Properties, and Thermal Stability
by Timo Müller, Joseph Grimwood, Andrea Bachmaier and Reinhard Pippan
Metals 2018, 8(5), 363; https://doi.org/10.3390/met8050363 - 17 May 2018
Cited by 15 | Viewed by 4795
Abstract
A new citrate-based electrolyte is proposed for the electrodeposition of thick Fe-C films. The structure and properties of the deposits are compared to those from another electrolyte previously reported in the literature. Both consist of a nanocrystalline single-phase structure with a grain size [...] Read more.
A new citrate-based electrolyte is proposed for the electrodeposition of thick Fe-C films. The structure and properties of the deposits are compared to those from another electrolyte previously reported in the literature. Both consist of a nanocrystalline single-phase structure with a grain size of 20 nm, which results in a hardness of up to 660 HV. Due to its higher growth rate, the new electrolyte is a promising candidate for the deposition of thick films. However, the codeposition of oxygen causes embrittlement, limiting the application of the deposits from both the new and the known electrolyte. On the other hand, the codeposited carbon and oxygen provide considerable thermal stability and even a hardening capacity upon annealing. The results are compared and discussed with respect to the previous investigations of electrodeposited Fe-C alloys. Full article
(This article belongs to the Special Issue Electrochemical Deposition)
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