Special Issue "Atomic Layer Deposition"

A special issue of Coatings (ISSN 2079-6412).

Deadline for manuscript submissions: 31 October 2018

Special Issue Editor

Guest Editor
Prof. Dr. David Cameron

Dept.of Physical Electronics, Masaryk University, Brno, Czech Republic
Website | E-Mail
Interests: thin film technology; atomic layer deposition; plasma CVD; magnetron sputtering; sol-gel deposition

Special Issue Information

Dear Colleagues,

Atomic Layer Deposition (ALD) has developed from its early beginnings in the Soviet Union and Finland into a process that is critical for microlectronics manufacturing and also extends into many other areas, for example, flexible electronics, displays, anti-corrosion layers, catalysis and pharmaceuticals. This Special Issue of Coatings on “Atomic Layer Deposition” is intended to cover original research and critical review articles on recent advances in all aspects of ALD.

In particular, the topics of interest include, but are not limited to:

  • ALD processes for materials and devices;
  • Characterization of ALD coatings;
  • ALD nucleation, growth phenomena and process modelling;
  • Applications of ALD;
  • Spatial and roll-to-roll ALD processes.

Prof. Dr. David Cameron
Guest Editor

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All papers will be peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Coatings is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 1200 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Published Papers (2 papers)

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Research

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Open AccessFeature PaperArticle Catalytic Performance of Ag2O and Ag Doped CeO2 Prepared by Atomic Layer Deposition for Diesel Soot Oxidation
Coatings 2018, 8(7), 237; https://doi.org/10.3390/coatings8070237
Received: 31 May 2018 / Revised: 28 June 2018 / Accepted: 28 June 2018 / Published: 4 July 2018
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Abstract
The catalytic behaviour of Ag2O and Ag doped CeO2 thin films, deposited by atomic layer deposition (ALD), was investigated for diesel soot oxidation. The silver oxide was deposited from pulses of the organometallic precursor (hfac)Ag(PMe3) and ozone at
[...] Read more.
The catalytic behaviour of Ag2O and Ag doped CeO2 thin films, deposited by atomic layer deposition (ALD), was investigated for diesel soot oxidation. The silver oxide was deposited from pulses of the organometallic precursor (hfac)Ag(PMe3) and ozone at 200 °C with growth rate of 0.28 Å/cycle. Thickness, crystallinity, elemental composition, and morphology of the Ag2O and Ag doped CeO2 films deposited on Si (100) were characterized by ellipsometry, X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM), and field emission scanning electron microscopy (FESEM), respectively. The catalytic effect on diesel soot combustion of pure Ag2O, CeO2, and Ag doped CeO2 films grown on stainless steel foil supports was measured with oxidation tests. Nominally CeO2:Ag 10:1 doped CeO2 films were most effective and oxidized 100% of soot at 390 °C, while the Ag2O films were 100% effective at 410 °C. The doped films also showed much higher stability; their performance remained stable after five tests with only a 10% initial reduction in efficiency whereas the performance of the Ag2O films reduced by 50% after the first test. It was concluded that the presence of Ag+ sites on the catalyst is responsible for the high soot oxidation activity. Full article
(This article belongs to the Special Issue Atomic Layer Deposition)
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Review

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Open AccessReview Metal Fluorides as Lithium-Ion Battery Materials: An Atomic Layer Deposition Perspective
Coatings 2018, 8(8), 277; https://doi.org/10.3390/coatings8080277
Received: 9 June 2018 / Revised: 25 July 2018 / Accepted: 6 August 2018 / Published: 8 August 2018
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Abstract
Lithium-ion batteries are the enabling technology for a variety of modern day devices, including cell phones, laptops and electric vehicles. To answer the energy and voltage demands of future applications, further materials engineering of the battery components is necessary. To that end, metal
[...] Read more.
Lithium-ion batteries are the enabling technology for a variety of modern day devices, including cell phones, laptops and electric vehicles. To answer the energy and voltage demands of future applications, further materials engineering of the battery components is necessary. To that end, metal fluorides could provide interesting new conversion cathode and solid electrolyte materials for future batteries. To be applicable in thin film batteries, metal fluorides should be deposited with a method providing a high level of control over uniformity and conformality on various substrate materials and geometries. Atomic layer deposition (ALD), a method widely used in microelectronics, offers unrivalled film uniformity and conformality, in conjunction with strict control of film composition. In this review, the basics of lithium-ion batteries are shortly introduced, followed by a discussion of metal fluorides as potential lithium-ion battery materials. The basics of ALD are then covered, followed by a review of some conventional lithium-ion battery materials that have been deposited by ALD. Finally, metal fluoride ALD processes reported in the literature are comprehensively reviewed. It is clear that more research on the ALD of fluorides is needed, especially transition metal fluorides, to expand the number of potential battery materials available. Full article
(This article belongs to the Special Issue Atomic Layer Deposition)
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Graphical abstract

Planned Papers

The below list represents only planned manuscripts. Some of these manuscripts have not been received by the Editorial Office yet. Papers submitted to MDPI journals are subject to peer-review.

Author: Tommi Kääriäinen
Title: Biocompatibility of Thin Film Materials by Atomic Layer Deposition: In vitro and In vivo Studies

Author: Victor M. Prida
Title: Electrostatic Supercapacitors by Atomic Layer Deposition on Nanoporous Anodic Alumina Templates for Environmentally Sustainable Energy Storage

Author: Richard Krumpolec, Tomáš Homola, David C. Cameron, Josef Humliček, Ondre Caha, Karla Kuldová, Raul Zazpe, Jan Přikryl and Jan Macák
Title:
Structural and Optical Properties of Luminescent Copper (I) Chloride Thin Films deposited by Atomic Layer Deposition

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