SU-8 Photolithography as a Toolbox for Carbon MEMS
AbstractThe use of SU-8 as precursor for glass-like carbon, or glassy carbon, is presented here. SU-8 carbonizes when subject to high temperature under inert atmosphere. Although epoxy-based precursors can be patterned in a variety of ways, photolithography is chosen due to its resolution and reproducibility. Here, a number of improvements to traditional photolithography are introduced to increase the versatility of the process. The shrinkage of SU-8 during carbonization is then detailed as one of the guidelines necessary to design carbon patterns. A couple of applications—(1) carbon-electrode dielectrophoresis for bioparticle manipulation; and (2) the use of carbon structures as micro-molds are also presented. View Full-Text
- Supplementary File 1:
Supplementary Materials (PDF, 359 KB)
Scifeed alert for new publicationsNever miss any articles matching your research from any publisher
- Get alerts for new papers matching your research
- Find out the new papers from selected authors
- Updated daily for 49'000+ journals and 6000+ publishers
- Define your Scifeed now
Martinez-Duarte, R. SU-8 Photolithography as a Toolbox for Carbon MEMS. Micromachines 2014, 5, 766-782.
Martinez-Duarte R. SU-8 Photolithography as a Toolbox for Carbon MEMS. Micromachines. 2014; 5(3):766-782.Chicago/Turabian Style
Martinez-Duarte, Rodrigo. 2014. "SU-8 Photolithography as a Toolbox for Carbon MEMS." Micromachines 5, no. 3: 766-782.