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Micromachines 2014, 5(3), 766-782; doi:10.3390/mi5030766

SU-8 Photolithography as a Toolbox for Carbon MEMS

Mechanical Engineering Department, Clemson University, 250 Fluor Daniel, Clemson, SC 29634, USA
Received: 26 June 2014 / Revised: 4 September 2014 / Accepted: 9 September 2014 / Published: 22 September 2014
(This article belongs to the Special Issue 15 Years of SU8 as MEMS Material)
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Abstract

The use of SU-8 as precursor for glass-like carbon, or glassy carbon, is presented here. SU-8 carbonizes when subject to high temperature under inert atmosphere. Although epoxy-based precursors can be patterned in a variety of ways, photolithography is chosen due to its resolution and reproducibility. Here, a number of improvements to traditional photolithography are introduced to increase the versatility of the process. The shrinkage of SU-8 during carbonization is then detailed as one of the guidelines necessary to design carbon patterns. A couple of applications—(1) carbon-electrode dielectrophoresis for bioparticle manipulation; and (2) the use of carbon structures as micro-molds are also presented. View Full-Text
Keywords: dielectrophoresis; micromolding; pyrolysis; epoxy; shrinkage; tapered; polymer substrate; grayscale; high aspect ratio; microfluidics dielectrophoresis; micromolding; pyrolysis; epoxy; shrinkage; tapered; polymer substrate; grayscale; high aspect ratio; microfluidics
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This is an open access article distributed under the Creative Commons Attribution License (CC BY 3.0).

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Martinez-Duarte, R. SU-8 Photolithography as a Toolbox for Carbon MEMS. Micromachines 2014, 5, 766-782.

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