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Micromachines 2014, 5(3), 738-755; doi:10.3390/mi5030738

Optimized SU-8 Processing for Low-Cost Microstructures Fabrication without Cleanroom Facilities

1
Centro Algoritmi, University of Minho, Campus de Azurém, 4800-058 Guimarães, Portugal
2
Centro de Física, University of Minho, Campus de Gualtar, 4710-057 Braga, Portugal
*
Author to whom correspondence should be addressed.
Received: 14 July 2014 / Revised: 9 September 2014 / Accepted: 12 September 2014 / Published: 22 September 2014
(This article belongs to the Special Issue 15 Years of SU8 as MEMS Material)
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Abstract

The study and optimization of epoxy-based negative photoresist (SU-8) microstructures through a low-cost process and without the need for cleanroom facility is presented in this paper. It is demonstrated that the Ultraviolet Rays (UV) exposure equipment, commonly used in the Printed Circuit Board (PCB) industry, can replace the more expensive and less available equipment, as the Mask Aligner that has been used in the last 15 years for SU-8 patterning. Moreover, high transparency masks, printed in a photomask, are used, instead of expensive chromium masks. The fabrication of well-defined SU-8 microstructures with aspect ratios more than 20 is successfully demonstrated with those facilities. The viability of using the gray-scale technology in the photomasks for the fabrication of 3D microstructures is also reported. Moreover, SU-8 microstructures for different applications are shown throughout the paper. View Full-Text
Keywords: SU-8; UV photolithography; low-cost microfabrication; without cleanroom facility; microfluidic; MEMS SU-8; UV photolithography; low-cost microfabrication; without cleanroom facility; microfluidic; MEMS
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This is an open access article distributed under the Creative Commons Attribution License (CC BY 3.0).

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MDPI and ACS Style

Pinto, V.C.; Sousa, P.J.; Cardoso, V.F.; Minas, G. Optimized SU-8 Processing for Low-Cost Microstructures Fabrication without Cleanroom Facilities. Micromachines 2014, 5, 738-755.

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