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Micromachines 2015, 6(1), 1-18; doi:10.3390/mi6010001

Innovative SU-8 Lithography Techniques and Their Applications

1
Department of Electrical Engineering, University of Texas, Dallas, Richardson, TX 75080, USA
2
Siliconfile Technologies, Inc., Seongnam-si, Gyeonggi-do 463-050, Korea
3
Department of Information and Communication Engineering, Hanbat National University, Daejeon 305-719, Korea
*
Author to whom correspondence should be addressed.
Academic Editor: Arnaud Bertsch
Received: 3 October 2014 / Accepted: 9 December 2014 / Published: 23 December 2014
(This article belongs to the Special Issue 15 Years of SU8 as MEMS Material)
View Full-Text   |   Download PDF [6689 KB, uploaded 23 December 2014]   |  

Abstract

SU-8 has been widely used in a variety of applications for creating structures in micro-scale as well as sub-micron scales for more than 15 years. One of the most common structures made of SU-8 is tall (up to millimeters) high-aspect-ratio (up to 100:1) 3D microstructure, which is far better than that made of any other photoresists. There has been a great deal of efforts in developing innovative unconventional lithography techniques to fully utilize the thick high aspect ratio nature of the SU-8 photoresist. Those unconventional lithography techniques include inclined ultraviolet (UV) exposure, back-side UV exposure, drawing lithography, and moving-mask UV lithography. In addition, since SU-8 is a negative-tone photoresist, it has been a popular choice of material for multiple-photon interference lithography for the periodic structure in scales down to deep sub-microns such as photonic crystals. These innovative lithography techniques for SU-8 have led to a lot of unprecedented capabilities for creating unique micro- and nano-structures. This paper reviews such innovative lithography techniques developed in the past 15 years or so. View Full-Text
Keywords: SU-8; lithography; backside; inclined; holographic interference SU-8; lithography; backside; inclined; holographic interference
This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. (CC BY 4.0).

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Lee, J.B.; Choi, K.-H.; Yoo, K. Innovative SU-8 Lithography Techniques and Their Applications. Micromachines 2015, 6, 1-18.

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