Latest Progress in Wide Band-Gap Semiconductors

A special issue of Electronics (ISSN 2079-9292). This special issue belongs to the section "Semiconductor Devices".

Deadline for manuscript submissions: closed (1 January 2022) | Viewed by 2431

Special Issue Editors


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Guest Editor
School of Physics, Peking University, Beijing 100871, China
Interests: GaN-based wide bandgap semiconductors; 2D semiconductor materials

E-Mail Website
Guest Editor
School of Physics, Peking University, Beijing 100871, China
Interests: GaN-based wide bandgap semiconductors; semiconductor lighting
International Center for Materials Nanoarchitectonics, National Insitute for Materials Science, 1 Chome Namiki 305-0044, Japan
Interests: III-V Nitride; epitaxial growth; MOS/MIS interface; power devices; solar cells; photodiodes; electronic devices
Special Issues, Collections and Topics in MDPI journals
School of Electrical, Computer & Energy Engineering, Arizona State University, Tempe, AZ, USA
Interests: epitaxial thin film growth by MOCVD and RF sputtering; in situ/operando x-ray characterizations of III–V nitride; GaN-based heterointerface and surface dynamics; micro-LEDs

Special Issue Information

Dear Colleagues,

Semiconductor materials and devices play a major role in science and technology in modern society. In fact, semiconductor material systems have now entered a new era, driven by demands stemming from accelerating advances in science and technology, which push forward the development of wide bandgap semiconductor materials and devices toward high power, low energy consumption, multiwavelength band, ultrafast response, miniaturization, and high integration degrees. The high-tech industry in the areas of information, energy, transportation, etc., constantly needs new wide bandgap semiconductor materials and devices, and those demands become a new and strong driving force for a more rapid development of the latter. The topics covered within this Special Issue include but are not limited to the following:

  • The epitaxial growth of the wide band gap semiconductors (III-nitride semiconductors, SiC, ZnO, diamond, Ga2O3, etc.) and their low-dimensional quantum structures;
  • Optical and electronic properties, doping and defects, structural analysis, and defect characterization;
  • Optical devices such as micro-LEDs, VCSEL, edge emitting laser diodes, UV–LEDs, UV–laser diodes, single photon emitters, photodetectors, and intersubband emitters;
  • Electronic devices for high power switching, high frequency, RF applications, etc.;
  • Novel materials, nanostructures, and device concepts.

Prof. Dr. Ning Tang
Prof. Dr. Bo Shen
Dr. Liwen Sang
Dr. Guangxu Ju
Guest Editors

Manuscript Submission Information

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Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Electronics is an international peer-reviewed open access semimonthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2400 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Published Papers (1 paper)

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Research

7 pages, 2955 KiB  
Article
Metal Organic Vapor Phase Epitaxy of Thick N-Polar InGaN Films
by Nirupam Hatui, Athith Krishna, Shubhra S. Pasayat, Stacia Keller and Umesh K. Mishra
Electronics 2021, 10(10), 1182; https://doi.org/10.3390/electronics10101182 - 15 May 2021
Cited by 3 | Viewed by 1762
Abstract
Hillock-free thick InGaN layers were grown on N-polar GaN on sapphire by metal organic vapor phase epitaxy using a digital growth scheme and H2 as surfactant. Introducing Mg to act as an additional surfactant and optimizing the H2 pulse time, In [...] Read more.
Hillock-free thick InGaN layers were grown on N-polar GaN on sapphire by metal organic vapor phase epitaxy using a digital growth scheme and H2 as surfactant. Introducing Mg to act as an additional surfactant and optimizing the H2 pulse time, In compositions up to 17% were obtained in 100 nm thick epilayers. Although Mg adversely affected the In incorporation, it enabled maintenance of a good surface morphology while decreasing the InGaN growth temperature, resulting in a net increase in In composition. The parameter space of growth temperature and Mg precursor flow to obtain hillock-free epilayers was mapped out. Full article
(This article belongs to the Special Issue Latest Progress in Wide Band-Gap Semiconductors)
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