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Functional Thin Films and Coatings: Present Status, Challenges, and a...
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Functional Thin Films and Coatings: Present Status, Challenges, and a Look Forward

A special issue of Coatings (ISSN 2079-6412). This special issue belongs to the section "Thin Films".

Deadline for manuscript submissions: 15 October 2024 | Viewed by 1025

Special Issue Editor

Dr. Yanlong Wang

E-Mail Website
Guest Editor
Dalian Institute of Chemical Physics, Chinese Academy of Sciences, Dalian 116023, China
Interests: fabrication and characterization of high-quality thin-film devices

Special Issue Information

Dear Colleagues,

Functional thin films can achieve specific functions through physical, chemical or biological means, and they have been widely used in electronics, optoelectronics, medicine, environmental protection, and other fields. Therefore, they play an important role in the development of modern science and technology.

Despite the great progress in this field, several significant challenges still remain, such as the exploration of an advanced theoretical mechanism, the fabrication of on-demand designed high-quality thin films, and the precise control of their performance.

This Special Issue will serve as a forum for papers on the following topics:

  • The design and preparation of functional films and/or coatings;
  • The advanced characterization of films or coatings;
  • The preparation and application of functional films and/or coatings;
  • The theoretical calculation of functional films and/or coatings;
  • New mechanisms of novel properties for functional films.

Dr. Yanlong Wang
Guest Editor

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Coatings is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • functional coatings
  • optical properties
  • thin films
  • spectroscopy
  • advanced characterization

Published Papers (1 paper)

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Research

10 pages, 3741 KiB  
Article
High-Rate Epitaxial Growth of Silicon Using Electron Beam Evaporation at High Temperatures
by Marit Stange, Tor Olav Sunde, Runar Dahl-Hansen, Kalpna Rajput, Joachim Seland Graff, Branson D. Belle and Alexander G. Ulyashin
Coatings 2023, 13(12), 2030; https://doi.org/10.3390/coatings13122030 - 30 Nov 2023
Viewed by 821
Abstract
This paper describes the high-rate (~1.5 μm/min) growth of Si films on Si supporting substrates with (100) crystallographic orientation at 600 °C, 800 °C, and 1000 °C in a vacuum environment of ~1 × 10−5 mbar using electron beam (e-beam) evaporation. The [...] Read more.
This paper describes the high-rate (~1.5 μm/min) growth of Si films on Si supporting substrates with (100) crystallographic orientation at 600 °C, 800 °C, and 1000 °C in a vacuum environment of ~1 × 10−5 mbar using electron beam (e-beam) evaporation. The microstructure, crystallinity, and conductivity of such films were investigated. It was established that fully crystalline (Raman spectroscopy, EBSD) and stress-free epi-Si layers with a thickness of approximately 50 µm can be fabricated at 1000 °C, while at 600 °C and 800 °C, some poly-Si inclusions were observed using Raman spectroscopy. Hall effect measurements showed that epi-Si layers deposited at 1000 °C had resistivity, carrier concentration, and mobility comparable to those obtained for c-Si wafers fabricated through ingot growth and wafering using the same solar grade Si feedstock used for the e-beam depositions. The dislocation densities were determined to be ∼2 × 107 cm−2 and ∼5 × 106 cm−2 at 800 and 1000 °C, respectively, using Secco etch. The results highlight the potential of e-beam evaporation as a promising and cost-effective alternative to conventional CVD for the growth of epi-Si layers and, potentially, epi-Si wafers. Some of the remaining technical challenges of this deposition technology are briefly indicated and discussed. Full article
(This article belongs to the Special Issue Functional Thin Films and Coatings: Present Status, Challenges, and a Look Forward)
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