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Micromachines 2014, 5(3), 583-593; doi:10.3390/mi5030583

Inkjet Printing of High Aspect Ratio Superparamagnetic SU-8 Microstructures with Preferential Magnetic Directions

1
Microsystems Laboratory, Ecole Polytechnique Fédérale de Lausanne (EPFL), 1015 Lausanne, Switzerland
2
Multi-Scale Robotics Lab, Institute of Robotics and Intelligent Systems, ETH Zurich, 8092 Zurich, Switzerland
3
Micro and Nanosystems, ETH Zurich, 8092 Zurich, Switzerland
Present Address: Micro Resist Technology GmbH, Köpenicker Str. 325, 12555 Berlin, Germany.
Present Address: Takeuchi Biohybrid System Laboratory, The University of Tokyo, Komaba, Tokyo 153-0041, Japan.
§
Present Address: Laboratory for Micro- and Nanotechnology, Paul Scherrer Institut, 5232 Villigen-PSI, Switzerland.
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Present Address: Bio, Electro and Mechanical Systems, Ecole Polytechnique, Université Libre de Bruxelles, 1050 Bruxelles, Belgium.
*
Authors to whom correspondence should be addressed.
Received: 29 June 2014 / Revised: 2 August 2014 / Accepted: 18 August 2014 / Published: 25 August 2014
(This article belongs to the Special Issue 15 Years of SU8 as MEMS Material)
View Full-Text   |   Download PDF [3832 KB, uploaded 25 August 2014]   |  

Abstract

Structuring SU-8 based superparamagnetic polymer composite (SPMPC) containing Fe3O4 nanoparticles by photolithography is limited in thickness due to light absorption by the nanoparticles. Hence, obtaining thicker structures requires alternative processing techniques. This paper presents a method based on inkjet printing and thermal curing for the fabrication of much thicker hemispherical microstructures of SPMPC. The microstructures are fabricated by inkjet printing the nanoparticle-doped SU-8 onto flat substrates functionalized to reduce the surface energy and thus the wetting. The thickness and the aspect ratio of the printed structures are further increased by printing the composite onto substrates with confinement pedestals. Fully crosslinked microstructures with a thickness up to 88.8 μm and edge angle of 112° ± 4° are obtained. Manipulation of the microstructures by an external field is enabled by creating lines of densely aggregated nanoparticles inside the composite. To this end, the printed microstructures are placed within an external magnetic field directly before crosslinking inducing the aggregation of dense Fe3O4 nanoparticle lines with in-plane and out-of-plane directions. View Full-Text
Keywords: inkjet printing; polymer; superparamagnetic SU-8; hemispherical structures; thermal curing; low topographical confinement; magnetic anisotropy inkjet printing; polymer; superparamagnetic SU-8; hemispherical structures; thermal curing; low topographical confinement; magnetic anisotropy
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Jacot-Descombes, L.; Gullo, M.R.; Cadarso, V.J.; Mastrangeli, M.; Ergeneman, O.; Peters, C.; Fatio, P.; Freidy, M.A.; Hierold, C.; Nelson, B.J.; Brugger, J. Inkjet Printing of High Aspect Ratio Superparamagnetic SU-8 Microstructures with Preferential Magnetic Directions. Micromachines 2014, 5, 583-593.

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