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UV-LIGA: From Development to Commercialization
AbstractA major breakthrough in UV-LIGA (Lithographie, Galvanoformung and Abformung) started with the use of epoxy-based EPON® SU-8 photoresist in the mid-1990s. Using this photoresist has enabled the fabrication of tall and high aspect ratio structures without the use of a very expensive synchrotron source needed to expose the photoresist layer in X-ray LIGA. SU-8 photoresist appeared to be well-suited for LIGA templates, but also as a permanent material. Based on UV-LIGA and SU-8, Mimotec SA has developed processes to manufacture mold inserts and metallic components for various market fields. From one to three-level parts, from Ni to other materials, from simple to complicated parts with integrated functionalities, UV-LIGA has established itself as a manufacturing technology of importance for prototyping, as well as for mass-fabrication. This paper reviews some of the developments that led to commercial success in this field.
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Genolet, G.; Lorenz, H. UV-LIGA: From Development to Commercialization. Micromachines 2014, 5, 486-495.View more citation formats
Genolet G, Lorenz H. UV-LIGA: From Development to Commercialization. Micromachines. 2014; 5(3):486-495.Chicago/Turabian Style
Genolet, Grégoire; Lorenz, Hubert. 2014. "UV-LIGA: From Development to Commercialization." Micromachines 5, no. 3: 486-495.
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