Special Issue "Patterning and Photosensitive Polymers"


A special issue of Polymers (ISSN 2073-4360).

Deadline for manuscript submissions: closed (30 April 2014)

Special Issue Editor

Guest Editor
Prof. Dr. Svetlana Santer

Department of Physics and Astronomy, University of Potsdam, 14476 Potsdam-Golm, Germany
Website: http://www.exph.physik.uni-potsdam.de/research.html
Phone: +49 331 977 5762
Fax: +49 331 977 5615
Interests: thin functional polymer films; photosensitive polymer films; microscopy and spectroscopy of macromolecules and nano-objects at interfaces

Special Issue Information

Dear Colleagues,

Azobenzene-containing photosensitive films are intriguing multi-component systems that consist of polymer matrices modified with azobenzene groups. Under UV-irradiation, the azobenzene can undergo a reversible photo-isomerization from a trans- to a cis- state. This transition alters not only the physico-chemical properties of the azobenzene molecules themselves, but can also trigger a mechanical response within the polymer matrix the azobenzenes are embedded in.

The azobenzene-modified polymers play an important role in modern photonic, electronic, and opto-mechanical applications. They are successfully used to produce a variety of materials for reversible and irreversible micro- and nano-patterning, microlens arrays, plasmonic sensors, light-driven artificial muscles, and light-powered electrical switches. One key phenomenon, common to many applications, is the formation of so-called surface relief gratings (SRG) upon irradiation with an interference pattern. The resulting deformation patterns of the polymer films correspond with the irradiation’s variation of intensity or polarization, and occur at room temperature when azobenzene polymers are supposed to be in a glassy, solid state. The physical origin of this phenomenon has yet to be fully elucidated, and microscopic theories need to be devised that can connect to larger length scales.

This Special Issue aims at reviewing the current state-of-the-art concerning photosensitive azobenzene-containing polymer films, and at developing perspectives for future directions of research. The subjects to be addressed include: theories concerning azobenzene-containing polymers, photosensitive polymer brushes, photosensitive thin polymer films, the patterning of photosensitive polymers, the interaction of surface plasmons with photosensitive polymer films, the application of photosensitive polymer films, etc.

Prof. Dr. Svetlana Santer
Guest Editor


Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. Papers will be published continuously (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are refereed through a peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Polymers is an international peer-reviewed Open Access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 1400 CHF (Swiss Francs).


  • azobenzene-containing polymer films
  • photosensitive polymer brushes
  • surface relief grating
  • photo-alignment and photo-deformation
  • sub-diffraction patterning
  • computer modeling of photo-induced effects
  • theoretical approaches to photo-patterning

Published Papers (2 papers)

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p. 2037-2050
by , , , , , , , ,  and
Polymers 2014, 6(7), 2037-2050; doi:10.3390/polym6072037
Received: 30 April 2014 / Revised: 25 June 2014 / Accepted: 7 July 2014 / Published: 14 July 2014
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(This article belongs to the Special Issue Patterning and Photosensitive Polymers)
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p. 604-612
Polymers 2014, 6(3), 604-612; doi:10.3390/polym6030604
Received: 3 February 2014 / Revised: 16 February 2014 / Accepted: 27 February 2014 / Published: 5 March 2014
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Last update: 30 October 2013

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