Nearly Aberration-Free Multiphoton Polymerization into Thick Photoresist Layers
AbstractIn the era of lab-on-chip (LOC) devices, two-photon polymerization (TPP) is gaining more and more interest due to its capability of producing micrometer-sized 3D structures. With TPP, one may integrate functional structures into microfluidic systems by polymerizing them directly inside microchannels. When the feature of sub-micrometer size is a requirement, it is necessary to use high numerical aperture (NA) oil-immersion objectives that are optimized to work close to the glass substrate-photoresist interface. Further away from the substrate, that is, a few tens of micrometers into the photoresist, the focused beam undergoes focal spot elongation and focal position shift. These effects may eventually reduce the quality of the polymerized structures; therefore, it is desirable to eliminate them. We introduce a method that can highly improve the quality of structures polymerized tens of micrometers away from the substrate-photoresist interface by an oil-immersion, high NA objective. A spatial light-modulator is used to pre-compensate the phase-front distortion introduced by the interfacial refractive index jump on the strongly converging beam. View Full-Text
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Horváth, B.; Ormos, P.; Kelemen, L. Nearly Aberration-Free Multiphoton Polymerization into Thick Photoresist Layers. Micromachines 2017, 8, 219.
Horváth B, Ormos P, Kelemen L. Nearly Aberration-Free Multiphoton Polymerization into Thick Photoresist Layers. Micromachines. 2017; 8(7):219.Chicago/Turabian Style
Horváth, Bence; Ormos, Pál; Kelemen, Lóránd. 2017. "Nearly Aberration-Free Multiphoton Polymerization into Thick Photoresist Layers." Micromachines 8, no. 7: 219.
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