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Journal: Micromachines, 2017
Volume: 8
Number: 219

Article: Nearly Aberration-Free Multiphoton Polymerization into Thick Photoresist Layers
Authors: by Bence Horváth, Pál Ormos and Lóránd Kelemen
Link: https://www.mdpi.com/2072-666X/8/7/219

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