Stencil Lithography for Scalable Micro- and Nanomanufacturing
AbstractIn this paper, we review the current development of stencil lithography for scalable micro- and nanomanufacturing as a resistless and reusable patterning technique. We first introduce the motivation and advantages of stencil lithography for large-area micro- and nanopatterning. Then we review the progress of using rigid membranes such as SiNx and Si as stencil masks as well as stacking layers. We also review the current use of flexible membranes including a compliant SiNx membrane with springs, polyimide film, polydimethylsiloxane (PDMS) layer, and photoresist-based membranes as stencil lithography masks to address problems such as blurring and non-planar surface patterning. Moreover, we discuss the dynamic stencil lithography technique, which significantly improves the patterning throughput and speed by moving the stencil over the target substrate during deposition. Lastly, we discuss the future advancement of stencil lithography for a resistless, reusable, scalable, and programmable nanolithography method. View Full-Text
Share & Cite This Article
Du, K.; Ding, J.; Liu, Y.; Wathuthanthri, I.; Choi, C.-H. Stencil Lithography for Scalable Micro- and Nanomanufacturing. Micromachines 2017, 8, 131.
Du K, Ding J, Liu Y, Wathuthanthri I, Choi C-H. Stencil Lithography for Scalable Micro- and Nanomanufacturing. Micromachines. 2017; 8(4):131.Chicago/Turabian Style
Du, Ke; Ding, Junjun; Liu, Yuyang; Wathuthanthri, Ishan; Choi, Chang-Hwan. 2017. "Stencil Lithography for Scalable Micro- and Nanomanufacturing." Micromachines 8, no. 4: 131.
Note that from the first issue of 2016, MDPI journals use article numbers instead of page numbers. See further details here.