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Micromachines 2015, 6(1), 32-41; doi:10.3390/mi6010032

Electrophoretic Deposition of Gallium with High Deposition Rate

1
Multi-Scale Energy Systems (MuSES) Laboratory, Department of Mechanical Engineering-Engineering Mechanics, Michigan Technological University, 1400 Townsend Drive, Houghton, MI 49931, USA
2
Mechanical & Aerospace Engineering Department, The University of Texas at Arlington, 500 W. First Street, Arlington, TX 76019, USA
*
Author to whom correspondence should be addressed.
Academic Editor: Cheng Luo
Received: 31 October 2014 / Accepted: 11 December 2014 / Published: 23 December 2014
(This article belongs to the Special Issue Micro/Nano Fabrication)
View Full-Text   |   Download PDF [2164 KB, uploaded 23 December 2014]   |  

Abstract

In this work, electrophoretic deposition (EPD) is reported to form gallium thin film with high deposition rate and low cost while avoiding the highly toxic chemicals typically used in electroplating. A maximum deposition rate of ~0.6 μm/min, almost one order of magnitude higher than the typical value reported for electroplating, is obtained when employing a set of proper deposition parameters. The thickness of the film is shown to increase with deposition time when sequential deposition is employed. The concentration of Mg(NO3)2, the charging salt, is also found to be a critical factor to control the deposition rate. Various gallium micropatterns are obtained by masking the substrate during the process, demonstrating process compatibility with microfabrication. The reported novel approach can potentially be employed in a broad range of applications with Ga as a raw material, including microelectronics, photovoltaic cells, and flexible liquid metal microelectrodes. View Full-Text
Keywords: electrophoretic deposition; gallium; micro patterning; colloid electrophoretic deposition; gallium; micro patterning; colloid
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This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. (CC BY 4.0).

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Zhang, H.; Feng, Y.; Santhanagopalan, S.; Meng, D.D. Electrophoretic Deposition of Gallium with High Deposition Rate. Micromachines 2015, 6, 32-41.

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