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Micromachines 2011, 2(2), 221-257; doi:10.3390/mi2020221

Multi-Beam Interference Advances and Applications: Nano-Electronics, Photonic Crystals, Metamaterials, Subwavelength Structures, Optical Trapping, and Biomedical Structures

School of Electrical and Computer Engineering, Georgia Institute of Technology, Atlanta, GA 30332, USA
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Received: 14 April 2011 / Revised: 25 May 2011 / Accepted: 27 May 2011 / Published: 3 June 2011
(This article belongs to the Special Issue Nano-photonic Devices)
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Abstract

Research in recent years has greatly advanced the understanding and capabilities of multi-beam interference (MBI). With this technology it is now possible to generate a wide range of one-, two-, and three-dimensional periodic optical-intensity distributions at the micro- and nano-scale over a large length/area/volume. These patterns may be used directly or recorded in photo-sensitive materials using multi-beam interference lithography (MBIL) to accomplish subwavelength patterning. Advances in MBI and MBIL and a very wide range of applications areas including nano-electronics, photonic crystals, metamaterials, subwavelength structures, optical trapping, and biomedical structures are reviewed and put into a unified perspective. View Full-Text
Keywords: multi-beam interference; interference lithography; nano-electronics; photonic crystals; metamaterials; subwavelength structures; optical trapping; biomedical structures multi-beam interference; interference lithography; nano-electronics; photonic crystals; metamaterials; subwavelength structures; optical trapping; biomedical structures
This is an open access article distributed under the Creative Commons Attribution License (CC BY 3.0).

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Burrow, G.M.; Gaylord, T.K. Multi-Beam Interference Advances and Applications: Nano-Electronics, Photonic Crystals, Metamaterials, Subwavelength Structures, Optical Trapping, and Biomedical Structures. Micromachines 2011, 2, 221-257.

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