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Coatings 2018, 8(2), 52; https://doi.org/10.3390/coatings8020052

Scan-Mode Atmospheric-Pressure Plasma Jet Processed Reduced Graphene Oxides for Quasi-Solid-State Gel-Electrolyte Supercapacitors

1
Department of Electrical Engineering, National Taiwan University, Taipei City 10617, Taiwan
2
Graduate Institute of Applied Mechanics, National Taiwan University, Taipei City 10617, Taiwan
3
Department of Chemical Engineering, National Taiwan University, Taipei City 10617, Taiwan
4
Graduate Institute of Photonics and Optoelectronics, National Taiwan University, Taipei City 10617, Taiwan
*
Author to whom correspondence should be addressed.
Received: 18 December 2017 / Revised: 22 January 2018 / Accepted: 26 January 2018 / Published: 29 January 2018
(This article belongs to the Special Issue Nanostructured Thin Films)
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Abstract

A scanning atmospheric-pressure plasma jet (APPJ) is essential for high-throughput large-area and roll-to-roll processes. In this study, we evaluate scan-mode APPJ for processing reduced graphene oxides (rGOs) that are used as the electrodes of quasi-solid-state gel-electrolyte supercapacitors. rGO nanoflakes are mixed with ethyl cellulose (EC) and terpineol to form pastes for screen-printing. After screen-printing the pastes on carbon cloth, a DC-pulse nitrogen APPJ is used to process the pastes in the scan mode. The maximal temperature attained is ~550 °C with a thermal influence duration of ~10 s per scan. The pastes are scanned by APPJ for 0, 1, 3 and 5 times. X-ray photoelectron spectroscopy (XPS) indicates the reduction of C-O binding content as the number of scan increases, suggesting the oxidation/decomposition of EC. The areal capacitance increases and then decreases as the number of scan increases; the best achieved areal capacitance is 15.93 mF/cm2 with one APPJ scan, in comparison to 4.38 mF/cm2 without APPJ processing. The capacitance retention rate of the supercapacitor with the best performance is ~93% after a 1000-cycle cyclic voltammetry (CV) test. The optimal number of APPJ scans should enable the proper removal of inactive EC and improved wettability while minimizing the damage caused to rGOs by nitrogen APPJ processing. View Full-Text
Keywords: atmospheric pressure plasma; reduced graphene oxide; supercapacitor atmospheric pressure plasma; reduced graphene oxide; supercapacitor
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This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. (CC BY 4.0).

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Hsu, A.R.; Chien, H.-H.; Liao, C.-Y.; Lee, C.-C.; Tsai, J.-H.; Hsu, C.-C.; Cheng, I.-C.; Chen, J.-Z. Scan-Mode Atmospheric-Pressure Plasma Jet Processed Reduced Graphene Oxides for Quasi-Solid-State Gel-Electrolyte Supercapacitors. Coatings 2018, 8, 52.

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