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Journal: Coatings, 2017
Volume: 7
Number: 112

Article: Numerical Verification of Gallium Nitride Thin-Film Growth in a Large MOCVD Reactor
Authors: by Chih-Kai Hu, Chun-Jung Chen, Ta-Chin Wei, Tomi T. Li, Chih-Yung Huang, Chu-Li Chao and Yi-Jiun Lin
Link: https://www.mdpi.com/2079-6412/7/8/112

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