Next Article in Journal
Influence of Odd and Even Alkyl Chains on Supramolecular Nanoarchitecture via Self-Assembly of Tetraphenylethylene-Based AIEgens
Next Article in Special Issue
Current Status of Single Particle Imaging with X-ray Lasers
Previous Article in Journal
Multi-Layer Metallization Structure Development for Highly Efficient Polycrystalline SnSe Thermoelectric Devices
Previous Article in Special Issue
Ultrashort Free-Electron Laser X-ray Pulses
Article Menu
Issue 11 (November) cover image

Export Article

Open AccessFeature PaperArticle
Appl. Sci. 2017, 7(11), 1114; doi:10.3390/app7111114

The FLASH Facility: Advanced Options for FLASH2 and Future Perspectives

1
Deutsches Elektronen-Synchrotron (DESY), 22607 Hamburg, Germany
2
Physics Department and Center for Free-Electron Laser Science, University of Hamburg, 22761 Hamburg, Germany
*
Author to whom correspondence should be addressed.
Academic Editor: Kiyoshi Ueda
Received: 10 September 2017 / Revised: 13 October 2017 / Accepted: 16 October 2017 / Published: 28 October 2017
(This article belongs to the Special Issue X-Ray Free-Electron Laser)
View Full-Text   |   Download PDF [947 KB, uploaded 28 October 2017]   |  

Abstract

Since 2016, the two free-electron laser (FEL) lines FLASH1 and FLASH2 have been run simultaneously for users at DESY in Hamburg. With the installation of variable gap undulators in the new FLASH2 FEL line, many new possibilities have opened up in terms of photon parameters for experiments. What has been tested so far is post-saturation tapering, reverse tapering, harmonic lasing, harmonic lasing self-seeding and two-color lasing. At the moment, we are working on concepts to enhance the capabilities of the FLASH facility even further. A major part of the upgrade plans, known as FLASH2020, will involve the exchange of the fixed gap undulators in FLASH1 and the implementation of a new flexible undulator scheme aimed at providing coherent radiation for multi-color experiments over a broad wavelength range. The recent achievements in FLASH2 and the current status of plans for the further development of the facility are presented. View Full-Text
Keywords: free-electron lasers; variable gap undulators; frequency doubling free-electron lasers; variable gap undulators; frequency doubling
Figures

This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. (CC BY 4.0).

Share & Cite This Article

MDPI and ACS Style

Faatz, B.; Braune, M.; Hensler, O.; Honkavaara, K.; Kammering, R.; Kuhlmann, M.; Ploenjes, E.; Roensch-Schulenburg, J.; Schneidmiller, E.; Schreiber, S.; Tiedtke, K.; Tischer, M.; Treusch, R.; Vogt, M.; Wurth, W.; Yurkov, M.; Zemella, J. The FLASH Facility: Advanced Options for FLASH2 and Future Perspectives. Appl. Sci. 2017, 7, 1114.

Show more citation formats Show less citations formats

Note that from the first issue of 2016, MDPI journals use article numbers instead of page numbers. See further details here.

Related Articles

Article Metrics

Article Access Statistics

1

Comments

[Return to top]
Appl. Sci. EISSN 2076-3417 Published by MDPI AG, Basel, Switzerland RSS E-Mail Table of Contents Alert
Back to Top