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Journal: Appl. Sci., 2012
Volume: 2
Page(s): 233-244
233-244
Article: Optimization of Fluorine Plasma Treatment for Interface Improvement on HfO₂/In_0.53Ga_0.47As MOSFETs
Chen, Y.-T.; Wang, Y.; Xue, F.; Zhou, F.; Lee, J.C.

http://www.mdpi.com/2076-3417/2/1/233

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