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Appl. Sci. 2012, 2(1), 206-219; doi:10.3390/app2010206

Oxyfluoride Chemistry of Layered Perovskite Compounds

1,* , 2,3 and 2,3
Received: 14 February 2012 / Revised: 22 February 2012 / Accepted: 28 February 2012 / Published: 6 March 2012
(This article belongs to the Special Issue Organo-Fluorine Chemical Science)
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Abstract: In this paper, we review recent progress and new challenges in the area of oxyfluoride perovskite, especially layered systems including Ruddlesden-Popper (RP), Dion-Jacobson (DJ) and Aurivillius (AV) type perovskite families. It is difficult to synthesize oxyfluoride perovskite using a conventional solid-state reaction because of the high chemical stability of the simple fluoride starting materials. Nevertheless, persistent efforts made by solid-state chemists have led to a major breakthrough in stabilizing such a mixed anion system. In particular, it is known that layered perovskite compounds exhibit a rich variety of O/F site occupation according to the synthesis used. We also present the synthetic strategies to further extend RP type perovskite compounds, with particular reference to newly synthesized oxyfluorides, Sr2CoO3F and Sr3Fe2O5+xF2x (x ~ 0.44).
Keywords: oxyfluoride; layered perovskite; high-pressure synthesis; low-temperature fluorination oxyfluoride; layered perovskite; high-pressure synthesis; low-temperature fluorination
This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

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MDPI and ACS Style

Tsujimoto, Y.; Yamaura, K.; Takayama-Muromachi, E. Oxyfluoride Chemistry of Layered Perovskite Compounds. Appl. Sci. 2012, 2, 206-219.

AMA Style

Tsujimoto Y, Yamaura K, Takayama-Muromachi E. Oxyfluoride Chemistry of Layered Perovskite Compounds. Applied Sciences. 2012; 2(1):206-219.

Chicago/Turabian Style

Tsujimoto, Yoshihiro; Yamaura, Kazunari; Takayama-Muromachi, Eiji. 2012. "Oxyfluoride Chemistry of Layered Perovskite Compounds." Appl. Sci. 2, no. 1: 206-219.

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