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Micromachines 2014, 5(2), 228-238; doi:10.3390/mi5020228
Article

One-Step Combined-Nanolithography-and-Photolithography for a 2D Photonic Crystal TM Polarizer

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Received: 6 January 2014 / Revised: 15 April 2014 / Accepted: 21 April 2014 / Published: 29 April 2014
(This article belongs to the Special Issue Micro/Nano Fabrication)
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Abstract

Photonic crystals have been widely investigated since they have great potential to manipulate the flow of light in an ultra-compact-scale and enable numerous innovative applications. 2D slab photonic crystals for the telecommunication C band at around 1550 nm have multi-scale structures that are typically micron-scale waveguides and deep sub-micron-scale air hole arrays. Several steps of nanolithography and photolithography are usually used for the fabrication of multi-scale photonic crystals. In this work, we report a one-step lithography process to pattern both micron and deep sub-micron features simultaneously for the 2D slab photonic crystal using combined-nanoimprint-and-photolithography. As a demonstrator, a 2D silicon photonic crystal transverse magnetic (TM) polarizer was fabricated, and the operation was successfully demonstrated.
Keywords: combined-nanoimprint-and-photolithography; photonic crystals; hybrid mask mold; TM polarizer combined-nanoimprint-and-photolithography; photonic crystals; hybrid mask mold; TM polarizer
This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

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Choi, K.-H.; Huh, J.; Cui, Y.; Trivedi, K.; Hu, W.; Ju, B.-K.; Lee, J.-B. One-Step Combined-Nanolithography-and-Photolithography for a 2D Photonic Crystal TM Polarizer. Micromachines 2014, 5, 228-238.

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