Abstract: Photonic crystals have been widely investigated since they have great potential to manipulate the flow of light in an ultra-compact-scale and enable numerous innovative applications. 2D slab photonic crystals for the telecommunication C band at around 1550 nm have multi-scale structures that are typically micron-scale waveguides and deep sub-micron-scale air hole arrays. Several steps of nanolithography and photolithography are usually used for the fabrication of multi-scale photonic crystals. In this work, we report a one-step lithography process to pattern both micron and deep sub-micron features simultaneously for the 2D slab photonic crystal using combined-nanoimprint-and-photolithography. As a demonstrator, a 2D silicon photonic crystal transverse magnetic (TM) polarizer was fabricated, and the operation was successfully demonstrated.
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Choi, K.-H.; Huh, J.; Cui, Y.; Trivedi, K.; Hu, W.; Ju, B.-K.; Lee, J.-B. One-Step Combined-Nanolithography-and-Photolithography for a 2D Photonic Crystal TM Polarizer. Micromachines 2014, 5, 228-238.
Choi K-H, Huh J, Cui Y, Trivedi K, Hu W, Ju B-K, Lee J-B. One-Step Combined-Nanolithography-and-Photolithography for a 2D Photonic Crystal TM Polarizer. Micromachines. 2014; 5(2):228-238.
Choi, Kyung-Hak; Huh, Jinwoo; Cui, Yonghao; Trivedi, Krutarth; Hu, Walter; Ju, Byeong-Kwon; Lee, Jeong-Bong. 2014. "One-Step Combined-Nanolithography-and-Photolithography for a 2D Photonic Crystal TM Polarizer." Micromachines 5, no. 2: 228-238.