Next Article in Journal
The Five Ws (and one H) of Super-Hydrophobic Surfaces in Medicine
Next Article in Special Issue
An Experimental Investigation of Micro Pulsating Heat Pipes
Previous Article in Journal
Biomimetic Pieris rapae’s Nanostructure and Its Use as a Simple Sucrose Sensor
Article Menu

Export Article

Open AccessArticle
Micromachines 2014, 5(2), 228-238; doi:10.3390/mi5020228

One-Step Combined-Nanolithography-and-Photolithography for a 2D Photonic Crystal TM Polarizer

1
Department of Electrical Engineering, The University of Texas at Dallas, Richardson, TX 75080, USA
2
Siliconfile Technologies, Inc., Seongnam-si, Gyeonggi-do 463-050, Korea
3
Department of Electrical Engineering, Korea University, Seoul 136-701, Korea
These authors contributed equally to this work.
*
Author to whom correspondence should be addressed.
Received: 6 January 2014 / Revised: 15 April 2014 / Accepted: 21 April 2014 / Published: 29 April 2014
(This article belongs to the Special Issue Micro/Nano Fabrication)
View Full-Text   |   Download PDF [3105 KB, 5 May 2014; original version 29 April 2014]   |  

Abstract

Photonic crystals have been widely investigated since they have great potential to manipulate the flow of light in an ultra-compact-scale and enable numerous innovative applications. 2D slab photonic crystals for the telecommunication C band at around 1550 nm have multi-scale structures that are typically micron-scale waveguides and deep sub-micron-scale air hole arrays. Several steps of nanolithography and photolithography are usually used for the fabrication of multi-scale photonic crystals. In this work, we report a one-step lithography process to pattern both micron and deep sub-micron features simultaneously for the 2D slab photonic crystal using combined-nanoimprint-and-photolithography. As a demonstrator, a 2D silicon photonic crystal transverse magnetic (TM) polarizer was fabricated, and the operation was successfully demonstrated.
Keywords: combined-nanoimprint-and-photolithography; photonic crystals; hybrid mask mold; TM polarizer combined-nanoimprint-and-photolithography; photonic crystals; hybrid mask mold; TM polarizer
Figures

This is an open access article distributed under the Creative Commons Attribution License (CC BY 3.0).

Scifeed alert for new publications

Never miss any articles matching your research from any publisher
  • Get alerts for new papers matching your research
  • Find out the new papers from selected authors
  • Updated daily for 49'000+ journals and 6000+ publishers
  • Define your Scifeed now

SciFeed Share & Cite This Article

MDPI and ACS Style

Choi, K.-H.; Huh, J.; Cui, Y.; Trivedi, K.; Hu, W.; Ju, B.-K.; Lee, J.-B. One-Step Combined-Nanolithography-and-Photolithography for a 2D Photonic Crystal TM Polarizer. Micromachines 2014, 5, 228-238.

Show more citation formats Show less citations formats

Related Articles

Article Metrics

Article Access Statistics

1

Comments

[Return to top]
Micromachines EISSN 2072-666X Published by MDPI AG, Basel, Switzerland RSS E-Mail Table of Contents Alert
Back to Top