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Micromachines 2014, 5(2), 228-238; doi:10.3390/mi5020228
Article

One-Step Combined-Nanolithography-and-Photolithography for a 2D Photonic Crystal TM Polarizer

1,2,†,* , 3,†
,
1
,
1
,
1
,
3
 and
1
1 Department of Electrical Engineering, The University of Texas at Dallas, Richardson, TX 75080, USA 2 Siliconfile Technologies, Inc., Seongnam-si, Gyeonggi-do 463-050, Korea 3 Department of Electrical Engineering, Korea University, Seoul 136-701, Korea These authors contributed equally to this work.
* Author to whom correspondence should be addressed.
Received: 6 January 2014 / Revised: 15 April 2014 / Accepted: 21 April 2014 / Published: 29 April 2014
(This article belongs to the Special Issue Micro/Nano Fabrication)
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Abstract

Photonic crystals have been widely investigated since they have great potential to manipulate the flow of light in an ultra-compact-scale and enable numerous innovative applications. 2D slab photonic crystals for the telecommunication C band at around 1550 nm have multi-scale structures that are typically micron-scale waveguides and deep sub-micron-scale air hole arrays. Several steps of nanolithography and photolithography are usually used for the fabrication of multi-scale photonic crystals. In this work, we report a one-step lithography process to pattern both micron and deep sub-micron features simultaneously for the 2D slab photonic crystal using combined-nanoimprint-and-photolithography. As a demonstrator, a 2D silicon photonic crystal transverse magnetic (TM) polarizer was fabricated, and the operation was successfully demonstrated.
Keywords: combined-nanoimprint-and-photolithography; photonic crystals; hybrid mask mold; TM polarizer combined-nanoimprint-and-photolithography; photonic crystals; hybrid mask mold; TM polarizer
This is an open access article distributed under the Creative Commons Attribution License (CC BY 3.0).
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Choi, K.-H.; Huh, J.; Cui, Y.; Trivedi, K.; Hu, W.; Ju, B.-K.; Lee, J.-B. One-Step Combined-Nanolithography-and-Photolithography for a 2D Photonic Crystal TM Polarizer. Micromachines 2014, 5, 228-238.

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