Next Article in Journal
Review on Electrodynamic Energy Harvesters—A Classification Approach
Next Article in Special Issue
Automated Ultrafiltration Device for Environmental Nanoparticle Research and Implications: A Review
Previous Article in Journal
Freeform Fabrication of Magnetophotonic Crystals with Diamond Lattices of Oxide and Metallic Glasses for Terahertz Wave Control by Micro Patterning Stereolithography and Low Temperature Sintering
Previous Article in Special Issue
Molecular Surveillance of Viral Processes Using Silicon Nitride Membranes
Article Menu

Export Article

Open AccessArticle
Micromachines 2013, 4(2), 157-167; doi:10.3390/mi4020157

Fabrication of a Polymer High-Aspect-Ratio Pillar Array Using UV Imprinting

Nano Processing System Division, Toshiba Machine Co., Ltd., 2068-3, Ooka, Numazu, Shizuoka 410-8510, Japan
Institutes for Nanoscience and Nanotechnology, Waseda University, 513 Wasedatsurumaki-cho, Shinjyuku, Tokyo 162-0041, Japan
Author to whom correspondence should be addressed.
Received: 30 January 2013 / Revised: 3 March 2013 / Accepted: 7 April 2013 / Published: 17 April 2013
(This article belongs to the Special Issue Micromachined Tools for Nanoscale Science and Technology)
View Full-Text   |   Download PDF [714 KB, uploaded 17 April 2013]   |  


This paper presents UV imprinting methods for fabricating a high-aspect-ratio pillar array. A polydimethylsiloxane (PDMS) mold was selected as the UV imprinting mold. The pillar pattern was formed on a 50 × 50 mm2 area on a polyethylene terephthalate (PET) film without remarkable deformation. The aspect ratios of the pillar and space were about four and ten, respectively. The mold was placed into contact with a UV-curable resin under a reduced pressure, and the resin was cured by UV light irradiation after exposure to atmospheric pressure. The PDMS mold showed good mold releasability and high flexibility. By moderately pressing the mold before UV-curing, the thickness of the residual layer of the imprinted resin was reduced and the pattern was precisely imprinted. Both batch pressing and roll pressing are available.
Keywords: high-aspect-ratio; UV imprinting; resin mold; polydimethylsiloxane high-aspect-ratio; UV imprinting; resin mold; polydimethylsiloxane
This is an open access article distributed under the Creative Commons Attribution License (CC BY 3.0).

Scifeed alert for new publications

Never miss any articles matching your research from any publisher
  • Get alerts for new papers matching your research
  • Find out the new papers from selected authors
  • Updated daily for 49'000+ journals and 6000+ publishers
  • Define your Scifeed now

SciFeed Share & Cite This Article

MDPI and ACS Style

Shinohara, H.; Goto, H.; Kasahara, T.; Mizuno, J. Fabrication of a Polymer High-Aspect-Ratio Pillar Array Using UV Imprinting. Micromachines 2013, 4, 157-167.

Show more citation formats Show less citations formats

Related Articles

Article Metrics

Article Access Statistics



[Return to top]
Micromachines EISSN 2072-666X Published by MDPI AG, Basel, Switzerland RSS E-Mail Table of Contents Alert
Back to Top