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Manufacture of Micromirror Arrays Using a CMOS-MEMS Technique
AbstractIn this study we used the commercial 0.35 µm CMOS (complementary metal oxide semiconductor) process and simple maskless post-processing to fabricate an array of micromirrors exhibiting high natural frequency. The micromirrors were manufactured from aluminum; the sacrificial layer was silicon dioxide. Because we fabricated the micromirror arrays using the standard CMOS process, they have the potential to be integrated with circuitry on a chip. For post-processing we used an etchant to remove the sacrificial layer and thereby suspend the micromirrors. The micromirror array contained a circular membrane and four fixed beams set symmetrically around and below the circular mirror; these four fan-shaped electrodes controlled the tilting of the micromirror. A MEMS (microelectromechanical system) motion analysis system and a confocal 3D-surface topography were used to characterize the properties and configuration of the micromirror array. Each micromirror could be rotated in four independent directions. Experimentally, we found that the micromirror had a tilting angle of about 2.55° when applying a driving voltage of 40 V. The natural frequency of the micromirrors was 59.1 kHz.
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Kao, P.-H.; Dai, C.-L.; Hsu, C.-C.; Wu, C.-C. Manufacture of Micromirror Arrays Using a CMOS-MEMS Technique. Sensors 2009, 9, 6219-6231.View more citation formats
Kao P-H, Dai C-L, Hsu C-C, Wu C-C. Manufacture of Micromirror Arrays Using a CMOS-MEMS Technique. Sensors. 2009; 9(8):6219-6231.Chicago/Turabian Style
Kao, Pin-Hsu; Dai, Ching-Liang; Hsu, Cheng-Chih; Wu, Chyan-Chyi. 2009. "Manufacture of Micromirror Arrays Using a CMOS-MEMS Technique." Sensors 9, no. 8: 6219-6231.
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