Keywordspalladium; nanotendrils; helium bubbles; catalysis; III–V semiconductors; nanofabrication; dense plasma focus; rapid thermal annealing; photoluminescence; transmittance; resistive switching; plasma treatment; ZnO nanowires; self-rectification; thermal plasma; annealing; gallium nitride; gallium nitrate hydrate; melamine; nanopowder; thin-film resistor; sputtering method; sheet resistance; value of temperature coefficient of resistance (TCR value); Bi-layer; atmospheric pressure plasma; DBD; silver oxide; ruthenium oxide; nanomaterials; nanocomposite; nanopowder; metal silicide; co-condensation; thermal plasma; modelling; thermal plasmas; lithium metal oxide; nanoparticle formation mechanism; plasmonic; dry plasma reduction; Ag nanoparticles; Au nanoparticles; dye-sensitized solar cells; particle coating; silicon oxide; dielectric barrier discharge; gas phase; continuous process; TEOS; CVD; suspension plasma spray; atomization; nanoparticles; multiphase flow; thermal spray; nanoparticles; TiAl3; TiN; hydrogen plasma-metal reaction; passivation; plasma etching; selectivity; surface chemistry; nanomesh; nanostructuring; polymer composite; biomaterials; adhesion; etch mask; radical atoms; n/a
