Plasma Nanoengineering and Nanofabrication

Edited by
November 2017
178 pages
  • ISBN978-3-03842-558-8 (Paperback)
  • ISBN978-3-03842-559-5 (PDF)

This book is a reprint of the Special Issue Plasma Nanoengineering and Nanofabrication that was published in

Chemistry & Materials Science
  • Paperback
License and Copyright
© 2018 by the authors; CC BY-NC-ND license
palladium; nanotendrils; helium bubbles; catalysis; III–V semiconductors; nanofabrication; dense plasma focus; rapid thermal annealing; photoluminescence; transmittance; resistive switching; plasma treatment; ZnO nanowires; self-rectification; thermal plasma; annealing; gallium nitride; gallium nitrate hydrate; melamine; nanopowder; thin-film resistor; sputtering method; sheet resistance; value of temperature coefficient of resistance (TCR value); Bi-layer; atmospheric pressure plasma; DBD; silver oxide; ruthenium oxide; nanomaterials; nanocomposite; nanopowder; metal silicide; co-condensation; thermal plasma; modelling; thermal plasmas; lithium metal oxide; nanoparticle formation mechanism; plasmonic; dry plasma reduction; Ag nanoparticles; Au nanoparticles; dye-sensitized solar cells; particle coating; silicon oxide; dielectric barrier discharge; gas phase; continuous process; TEOS; CVD; suspension plasma spray; atomization; nanoparticles; multiphase flow; thermal spray; nanoparticles; TiAl3; TiN; hydrogen plasma-metal reaction; passivation; plasma etching; selectivity; surface chemistry; nanomesh; nanostructuring; polymer composite; biomaterials; adhesion; etch mask; radical atoms; n/a

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