Reprint
CMOS-MEMS Fabrication Technologies and Devices
Edited by
September 2026
134 pages
- ISBN 978-3-7258-8661-6 (Hardback)
- ISBN 978-3-7258-8662-3 (PDF)
This is a Reprint of the Special Issue CMOS-MEMS Fabrication Technologies and Devices that was published in
Engineering
Summary
This Reprint collects 10 outstanding peer-reviewed articles, focusing on CMOS-MEMS fabrication technologies and devices. The content of these articles is within the scope of a Special Issue. Within the articles, CMOS gas sensors are assessed for gas mixture analysis; CMOS-MEMS pixel sensors are used for thermal neutron imaging; resistive microbolometers are fabricated via the CMOS process; an MEMS Pirani sensor is utilized for in situ pressure distribution sensing; CMOS low-noise amplifiers, power amplifiers, and energy micro-harvesters are manufactured using CMOS-MEMS technology; and high aspect ratio TSVs are used for 3D integration. This Reprint is especially relevant for any readers with an interest in the abovementioned topics.