Special Issue "Plasma Processing for Carbon-based Materials"
A special issue of C (ISSN 2311-5629).
Deadline for manuscript submissions: 31 October 2018
Prof. Dr. Mineo Hiramatsu
Department of Electrical and Electronic Engineering, Faculty of Science and Technology, Meijo University, Tempaku, Nagoya, Japan
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Interests: synthesis of diamond and carbon nanostructures including nanotubes and graphene; application of carbon nanostructures in the fields of energy generation and storage, electrochemical and bio-sensing, and cell culturing; plasma processing of materials including thin film formation, etching, and surface treatment; diagnostics of processing plasmas using spectroscopy and mass spectrometry
Carbon-based materials include diamond, diamond-like carbon (DLC), amorphous carbon as well as several graphene-based nanostructures. They are promising materials that can be potentially used in the fields of mechanical, optical, electric, electronic, electrochemical, bio, agricultural, and environmental applications. Most of carbon-based materials can be synthesized using several plasma apparatuses. Morphology including crystallinity and structure as well as mechanical, electrical, and optical properties of carbon-based materials should be controlled according to their applications. Plasma processing has a significant role in fabricating carbon-based materials and achieving their practical use in many areas. In order to realize industrial application using carbon-based materials, processing plasma should be optimized depending on their use. Sometimes, it is desirable to develop novel plasma processing specific to the materials. This Special Issue covers development of plasma processes for the synthesis of carbon-based materials including diamond, DLC, amorphous carbon, and several graphene-based nanostructures; investigation on the post processes such as integration techniques including etching and surface functionalization; diagnostics of plasma used for the synthesis of carbon-based materials. Emerging applications using carbon-based materials are also welcome. Hopefully this Special Issue forms a valuable contribution to the knowledge of plasma processing of carbon-based materials and stimulates further development of these fields. We look forward to your submissions.
Prof. Dr. Mineo Hiramatsu
Manuscript Submission Information
Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All papers will be peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.
Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. C is an international peer-reviewed open access quarterly journal published by MDPI.
Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) is waived for well-prepared manuscripts submitted to this issue. Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.
- Carbon nanotube
- Carbon nanostructures
- Amorphous carbon
- Plasma-enhanced CVD
- Plasma synthesis of carbon-based materials
- Plasma etching
- Surface treatment and functionalization using plasma
- Plasma diagnostics
- Characterization of carbon based-materials
- Application of carbon based-materials