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J. Low Power Electron. Appl. 2015, 5(2), 116-129; doi:10.3390/jlpea5020116

Impact of Low-Variability SOTB Process on Ultra-Low-Voltage Operation of 1 Million Logic Gates

Electroinformatics Group, Nanoelectronics Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), 1-1-1 Umezono, Tsukuba 3058568, Japan
Computer Science Course, Fundamental Science and Technology, Graduate School of Science and Technology, Meiji University, 1-1-1 Higashi-Mita Tama, Kawasaki 2148571, Japan
This is an extended version of a paper that was presented at the IEEE S3S Conference 2014.
Author to whom correspondence should be addressed.
Academic Editors: David Bol and Steven A. Vitale
Received: 20 February 2015 / Accepted: 20 May 2015 / Published: 25 May 2015
(This article belongs to the Special Issue Selected Papers from IEEE S3S Conference 2014)
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In this study, we demonstrate near-0.1 V minimum operating voltage of a low-variability Silicon on Thin Buried Oxide (SOTB) process for one million logic gates on silicon. Low process variability is required to obtain higher energy efficiency during ultra-low-voltage operation with steeper subthreshold slope transistors. In this study, we verify the decrease in operating voltage of logic circuits via a variability-suppressed SOTB process. In our measurement results with test chips fabricated in 65-nm SOTB and bulk processes, the operating voltage at which the first failure is observed was lowered from 0.2 to 0.125 V by introducing a low-variability SOTB process. Even at 0.115 V, over 40% yield can be expected as per our measurement results on SOTB test chips. View Full-Text
Keywords: SOTB; FD-SOI; ultra-low voltage; measurement on silicon SOTB; FD-SOI; ultra-low voltage; measurement on silicon

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This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. (CC BY 4.0).

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Ogasahara, Y.; Nakagawa, T.; Sekigawa, T.; Tsutsumi, T.; Koike, H. Impact of Low-Variability SOTB Process on Ultra-Low-Voltage Operation of 1 Million Logic Gates. J. Low Power Electron. Appl. 2015, 5, 116-129.

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J. Low Power Electron. Appl. EISSN 2079-9268 Published by MDPI AG, Basel, Switzerland RSS E-Mail Table of Contents Alert
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