Next Article in Journal
A Comparative Analysis of Energy Costs of Photovoltaic, Solar Thermal, and Wind Electricity Generation Technologies
Next Article in Special Issue
Cutting-Edge High-Power Ultrafast Thin Disk Oscillators
Previous Article in Journal / Special Issue
Recent Developments in Experimental Techniques for Measuring Two Pulses Simultaneously
Appl. Sci. 2013, 3(1), 314-324; doi:10.3390/app3010314
Article

Front-End Light Source for aWaveform-Controlled High-Contrast Few-Cycle Laser System for High-Repetition Rate Relativistic Optics

1,2
,
1,* , 1
 and
1
Received: 28 November 2012 / Revised: 1 March 2013 / Accepted: 5 March 2013 / Published: 18 March 2013
(This article belongs to the Special Issue Ultraintense Ultrashort Pulse Lasers)
View Full-Text   |   Download PDF [1535 KB, uploaded 18 March 2013]   |   Browse Figures

Abstract

We present the current development of an injector for a high-contrast, ultrashort laser system devoted to relativistic laser-plasma interaction in the few-cycle regime. The front-end is based on CEP-stabilized Ti:Sa CPA followed by XPW filter designed at the mJ level for temporal cleaning and shortening. Accurate characterization highlights the fidelity of the proposed injector. Measured CEP drift is 170 mrad rms.
Keywords: ultrafast lasers; carrier-envelope phase; ultrashort pulses ultrafast lasers; carrier-envelope phase; ultrashort pulses
This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited.

Share & Cite This Article

Further Mendeley | CiteULike
Export to BibTeX |
EndNote
MDPI and ACS Style

Ricci, A.; Jullien, A.; Rousseau, J.-P.; Lopez-Martens, R. Front-End Light Source for aWaveform-Controlled High-Contrast Few-Cycle Laser System for High-Repetition Rate Relativistic Optics. Appl. Sci. 2013, 3, 314-324.

View more citation formats

Article Metrics

For more information on the journal, click here

Comments

Cited By

[Return to top]
Appl. Sci. EISSN 2076-3417 Published by MDPI AG, Basel, Switzerland RSS E-Mail Table of Contents Alert