Appl. Sci. 2013, 3(1), 314-324; doi:10.3390/app3010314
Article

Front-End Light Source for aWaveform-Controlled High-Contrast Few-Cycle Laser System for High-Repetition Rate Relativistic Optics

1 Laboratoire d'Optique Appliqu´ee, ENSTA-Paristech, Ecole Polytechnique, CNRS, 91762 Palaiseaucedex, France 2 Thales Optronique SA, Laser Solutions Unit, 2 Avenue Gay-Lussac, 78995 Elancourt, France
* Author to whom correspondence should be addressed.
Received: 28 November 2012; in revised form: 1 March 2013 / Accepted: 5 March 2013 / Published: 18 March 2013
(This article belongs to the Special Issue Ultraintense Ultrashort Pulse Lasers)
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Abstract: We present the current development of an injector for a high-contrast, ultrashort laser system devoted to relativistic laser-plasma interaction in the few-cycle regime. The front-end is based on CEP-stabilized Ti:Sa CPA followed by XPW filter designed at the mJ level for temporal cleaning and shortening. Accurate characterization highlights the fidelity of the proposed injector. Measured CEP drift is 170 mrad rms.
Keywords: ultrafast lasers; carrier-envelope phase; ultrashort pulses

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MDPI and ACS Style

Ricci, A.; Jullien, A.; Rousseau, J.-P.; Lopez-Martens, R. Front-End Light Source for aWaveform-Controlled High-Contrast Few-Cycle Laser System for High-Repetition Rate Relativistic Optics. Appl. Sci. 2013, 3, 314-324.

AMA Style

Ricci A, Jullien A, Rousseau J-P, Lopez-Martens R. Front-End Light Source for aWaveform-Controlled High-Contrast Few-Cycle Laser System for High-Repetition Rate Relativistic Optics. Applied Sciences. 2013; 3(1):314-324.

Chicago/Turabian Style

Ricci, Aurélien; Jullien, Aurélie; Rousseau, Jean-Philippe; Lopez-Martens, Rodrigo. 2013. "Front-End Light Source for aWaveform-Controlled High-Contrast Few-Cycle Laser System for High-Repetition Rate Relativistic Optics." Appl. Sci. 3, no. 1: 314-324.

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