Block Co-Polymers for Nanolithography: Rapid Microwave Annealing for Pattern Formation on Substrates
Abstract
:1. Introduction
2. Experimental Section
2.1. Materials
Mn/g·mol−1 | Polymer | Polydispersity index, Mw/Mn | PS mole fraction, fPS |
---|---|---|---|
5,000 | PDMS-OH | 1.07 | - |
42,000 | PS-b-PDMS | 1.10 | 0.72 |
2.2. Polymer Brush Pre-Coating
2.3. Microwave Annealing of BCP Films
2.4. Plasma Etching of BCP Films
2.5. Characterization of Materials
3. Results
3.1. Self-Assembly on Planar Si3N4 Substrates
Material | Deposition condition | Contact angle (°) | Thickness (nm) | Spacing (nm) |
---|---|---|---|---|
Si3N4/Si substrate | as received | 46 ± 2 | - | - |
Si3N4/Si substrate | piranha cleaned | 32 ± 2 | - | - |
PDMS-OH + Si3N4/Si substrate | annealed/cleaned | 109 ± 2 | 4.1 | - |
BCP + PDMS-OH + Si3N4 substrate | as-cast BCP film (1.0 wt%) | - | 34.3 | 33.0 |
3.2. Effect of Anneal Time on Self-Assembly
3.3. Effect of Anneal Temperature on Self-Assembly
3.4. Directed Self-Assembly by Microwave Irradiation
4. Discussion and Conclusions
Acknowledgments
Appendix
A1. Experimental Details and Results of Thermal Annealing of PS-b-PDMS BCP Films
Author Contributions
Conflicts of Interest
References
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Borah, D.; Rasappa, S.; Senthamaraikannan, R.; Holmes, J.D.; Morris, M.A. Block Co-Polymers for Nanolithography: Rapid Microwave Annealing for Pattern Formation on Substrates. Polymers 2015, 7, 592-609. https://doi.org/10.3390/polym7040592
Borah D, Rasappa S, Senthamaraikannan R, Holmes JD, Morris MA. Block Co-Polymers for Nanolithography: Rapid Microwave Annealing for Pattern Formation on Substrates. Polymers. 2015; 7(4):592-609. https://doi.org/10.3390/polym7040592
Chicago/Turabian StyleBorah, Dipu, Sozaraj Rasappa, Ramsankar Senthamaraikannan, Justin D. Holmes, and Michael A. Morris. 2015. "Block Co-Polymers for Nanolithography: Rapid Microwave Annealing for Pattern Formation on Substrates" Polymers 7, no. 4: 592-609. https://doi.org/10.3390/polym7040592